SCHEMBL636497

SCHEMBL636497

O=C=NCC1CCC2CC(CN=C=O)CCC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11460874 0.88
SCHEMBL14646010 0.86
SCHEMBL1081557 0.83 ALDH1A1 (0.31)
SCHEMBL19732912 0.83 ALDH1A1 (0.31)
SCHEMBL44332 0.83 ALDH1A1 (0.31)
SCHEMBL1590056 0.83
SCHEMBL1081546 0.83 ALDH1A1 (0.31)
SCHEMBL560016 0.80
SCHEMBL3250801 0.79 NAAA (0.33)
SCHEMBL20462167 0.79 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118459436-A Preparation method and application of episulfide compound 益丰新材料股份有限公司 2024-08-09 CN claimed
CN-117126594-A Optical coating composition, optical coating and photovoltaic module comprising optical coating composition 浙江福斯特新材料研究院有限公司 2023-11-28 CN claimed
CN-116693790-A Composition for optical material and optical material 益丰新材料股份有限公司 2023-09-05 CN claimed
CN-116425660-A Composition for optical material and method for producing optical material 益丰新材料股份有限公司 2023-07-14 CN claimed
US-6130307-A POLY(THIO)URETHANES MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2000-10-10 US claimed
EP-4714937-A1 METHOD FOR PRODUCING TETRAFUNCTIONAL THIOL WITH EPISULFIDE RESIN AS STARTING MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-25 EP disclosed
CN-118459436-A Preparation method and application of episulfide compound 益丰新材料股份有限公司 2024-08-09 CN disclosed
CN-116143767-B Episulfide compound, composition for optical material, optical material and application 益丰新材料股份有限公司 2024-02-23 CN disclosed
CN-116478124-B Novel episulfide compound and optical material composition thereof 益丰新材料股份有限公司 2023-12-01 CN disclosed
CN-117126594-A Optical coating composition, optical coating and photovoltaic module comprising optical coating composition 浙江福斯特新材料研究院有限公司 2023-11-28 CN disclosed
CN-116947717-A Preparation method of low-chroma pentaerythritol sulfhydryl carboxylic ester 益丰新材料股份有限公司 2023-10-27 CN disclosed
CN-116478148-B Episulfide compound and application thereof 益丰新材料股份有限公司 2023-10-13 CN disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
EP-1316819-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-04 EP disclosed
US-6472495-B1 RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-10-29 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
US-6130307-A POLY(THIO)URETHANES MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2000-10-10 US disclosed
EP-0936233-A2 Composition for a resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-18 EP disclosed