⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3315438 | 1.00 | — | — | |
| SCHEMBL3315106 | 0.82 | — | — | |
| SCHEMBL6176128 | 0.81 | TSHR (0.35) | — | |
| SCHEMBL18106104 | 0.80 | OPRM1 (0.52) | — | |
| SCHEMBL610212 | 0.80 | OPRM1 (0.52) | — | |
| SCHEMBL27916395 | 0.79 | — | — | |
| SCHEMBL13011270 | 0.79 | — | — | |
| SCHEMBL13109452 | 0.79 | LMNA (0.45) | — | |
| SCHEMBL3411855 | 0.79 | — | — | |
| SCHEMBL2759866 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 316 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-20170299963-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-19 | — | — | US | disclosed |
| US-9740100-B2 | Hemiacetal compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| EP-3184561-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-06-28 | — | — | EP | disclosed |
| US-9665002-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-30 | — | — | US | disclosed |
| EP-3032333-B1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2017-05-24 | — | — | EP | disclosed |
| US-9645491-B2 | Sulfonium salt, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9645491-B2 | Sulfonium salt, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20070148594-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-06-28 | — | — | US | disclosed |
| US-20070148594-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-06-28 | — | — | US | disclosed |
| US-20070128555-A1 | Novel ester compound, polymer, resist composition, and patterning process | CENTRAL GLASS CO., LTD. | 2007-06-07 | — | — | US | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |