SCHEMBL6378192

SCHEMBL6378192

O=C(OC(=O)C12CC3CC(CC(C3)C1)C2)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.52
GAA P10253 1/20 0.52
XBP1 P17861 1/20 0.52
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
ALDH1A1 P00352 1/20 0.48
NPSR1 Q6W5P4 1/20 0.48
PRKCA P17252 1/20 0.47
SCN1A P35498 1/20 0.47
SCN2A Q99250 1/20 0.47
SCN3A Q9NY46 1/20 0.47
GLA P06280 1/20 0.45
HSD11B1 P28845 2/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
CYP17A1 P05093 4/20 0.44
CYP19A1 P11511 4/20 0.44
KDM4E B2RXH2 1/20 0.44
THRB P10828 1/20 0.41
CYP2C9 P11712 1/20 0.41
LMNA P02545 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3322717 0.88 SCN1A (0.47) MAPTGAAXBP1MEN1KMT2A
SCHEMBL1439514 0.80 MAPT (0.48) MAPTGAAXBP1MEN1KMT2A
SCHEMBL1650441 0.80 MAPT (0.48) MAPTGAAXBP1MEN1KMT2A
SCHEMBL4734157 0.80 MAPT (0.48) MAPTGAAXBP1MEN1KMT2A
SCHEMBL905300 0.80 GLA (0.57) MAPTGAAXBP1MEN1KMT2A
SCHEMBL28308473 0.80 MAPT (0.48) MAPTGAAXBP1MEN1KMT2A
SCHEMBL8131125 0.80 LMNA (0.46) MAPTGAAXBP1MEN1KMT2A
SCHEMBL11899772 0.80 SCN1A (0.41) MAPTGAAXBP1MEN1KMT2A
SCHEMBL1300037 0.78 SCN1A (0.51) MAPTGAAXBP1MEN1KMT2A
SCHEMBL12132675 0.78 ALDH1A1 (0.58) MAPTGAAXBP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020132057-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH ANHYDRIDE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION (US) 2020-06-25 WO claimed
US-20200203711-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH ANHYDRIDE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2020-06-25 US claimed
CN-108440308-A The synthetic method of 1,3,5- triaminobenzenes 北京理工大学 2018-08-24 CN claimed
CN-119191950-A Asymmetric diaryl ketone compound and synthetic method thereof 海南大学 2024-12-27 CN disclosed
US-11837711-B2 Silicon-based energy storage devices with anhydride containing electrolyte additives ENEVATE CORPORATION (US) 2023-12-05 US disclosed
US-11837711-B2 Silicon-based energy storage devices with anhydride containing electrolyte additives ENEVATE CORPORATION (US) 2023-12-05 US disclosed
CN-113227027-A Method for producing organic compound M技术株式会社 2021-08-06 CN disclosed
US-20210167361-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH ANHYDRIDE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2021-06-03 US disclosed
US-10957898-B2 Silicon-based energy storage devices with anhydride containing electrolyte additives ENEVATE CORPORATION (US) 2021-03-23 US disclosed
US-10957898-B2 Silicon-based energy storage devices with anhydride containing electrolyte additives ENEVATE CORPORATION (US) 2021-03-23 US disclosed
WO-2020132057-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH ANHYDRIDE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION (US) 2020-06-25 WO disclosed
US-20160062236-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2016-03-03 US disclosed
US-20050142487-A1 Polymerizable adamantane derivative, production process thereof and polymeric compound DAICEL CHEMICAL INDUSTRIES, LTD. 2005-06-30 US disclosed
US-6670499-B1 Bis-Methacryloyloxy-adamantanedicarboxylate derivatives; raw materials for dental materials and lenses; transparency, luster, hardness, water resistance DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-12-30 US disclosed
EP-0972776-B1 A phosphine sulfide, a manufacturing process therefor and a use thereof MITSUI CHEMICALS INC (JP) 2003-04-23 EP disclosed
EP-1164125-A1 ADAMANTANE DERIVATIVES AND PROCESSES FOR THE PREPARATION THEREOF Daicel Chemical Industries, Ltd. (JP) 2001-12-19 EP disclosed
US-6153794-A Phosphine sulfide, a manufacturing process therefor and use thereof MITSUI CHEMICALS, INC. (JP) 2000-11-28 US disclosed
CN-1262276-A Phosphine sulfide preparing process and use thereof MITSUI CHEMICALS INC (JP) 2000-08-09 CN disclosed
EP-0972776-A1 A phosphine sulfide, a manufacturing process therefor and a use thereof Mitsui Chemicals, Inc. (JP) 2000-01-19 EP disclosed
US-4017491-A 1,1-Diaryl-1H-tetrazole amines G. D. SEARLE & CO. (US) 1977-04-12 US disclosed