SCHEMBL6406713

SCHEMBL6406713

C=C(C=Cc1ccccc1)C(=O)OCC1CO1

nearest known ligand 0.61

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 7/20 0.61
ALDH1A1 P00352 1/20 0.48
LMNA P02545 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10894843 0.90 ALDH1A1 (0.54) MGLLALDH1A1LMNA
SCHEMBL10894671 0.88 ALDH1A1 (0.52) MGLLALDH1A1
SCHEMBL2767645 0.86 ALDH1A1 (0.50) MGLLALDH1A1
Cinnamic Acid SCHEMBL11667219 0.85 ALDH1A1 (0.61) MGLLALDH1A1LMNA
Cinnamic Acid SCHEMBL11667224 0.85 ALDH1A1 (0.61) MGLLALDH1A1LMNA
SCHEMBL10947224 0.84 ALDH1A1 (0.47) MGLLALDH1A1LMNA
SCHEMBL1132637 0.83 MGLL (0.84) MGLLLMNA
SCHEMBL1132635 0.83 MGLL (0.84) MGLLLMNA
SCHEMBL6230400 0.83 MGLL (0.52) MGLLALDH1A1
SCHEMBL10524492 0.83 ALDH1A1 (0.46) MGLLALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102876002-A Rapid molding high heat-resistant polyamide-polyphenyl ether alloy and preparation method thereof Cangnan county huifeng plastic co ltd 2013-01-16 CN claimed
CN-106496425-A The preparation method of glycidyl methacrylate fusion-grafting polyolefine material 杭州师范大学 2017-03-15 CN disclosed
CN-102876002-A Rapid molding high heat-resistant polyamide-polyphenyl ether alloy and preparation method thereof Cangnan county huifeng plastic co ltd 2013-01-16 CN disclosed
US-20050014438-A1 Electron emitting device, electron source, image forming apparatus and producing methods of them CANON KABUSHIKI KAISHA (JP) 2005-01-20 US disclosed
US-6827619-B2 Electron emitting device, electron source, image forming apparatus and producing methods of them CANON KABUSHIKI KAISHA (JP) 2004-12-07 US disclosed
US-20030020395-A1 Electron emitting device, electron source, image forming apparatus and producing methods of them ODA HITOSHI (JP) 2003-01-30 US disclosed
US-6492769-B1 Electron emitting device, electron source, image forming apparatus and producing methods of them CANON KABUSHIKI KAISHA (JP) 2002-12-10 US disclosed