Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 4/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | ACP3 | P15309 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.43 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1325661 | 0.83 | TDP1 (0.48) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL5830944 | 0.82 | CYP2C19 (0.56) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL7948847 | 0.79 | MTNR1A (0.49) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| Hydrogen Peroxide SCHEMBL17838078 | 0.79 | TDP1 (0.53) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL11792152 | 0.79 | TDP1 (0.53) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL7648676 | 0.78 | CYP2C19 (0.52) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL5252900 | 0.78 | CYP1A2 (0.52) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL7195640 | 0.78 | CYP2C19 (0.52) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL25106 | 0.78 | CYP1A2 (0.52) | CYP1A2CYP2C19CYP2C9TDP1ACP3 | |
| SCHEMBL30083984 | 0.78 | CYP1A2 (0.52) | CYP1A2CYP2C19CYP2C9TDP1ACP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117487097-A | Surface-modified carbon black, carbon black dispersion, and black resist composition | DIC株式会社 | 2024-02-02 | — | — | CN | disclosed |
| CN-117321109-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-116023607-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-115873214-A | Epoxy resin, photosensitive resin composition, resist film, curable composition, and cured film | DIC株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-107108418-B | Phenolic hydroxyl group-containing compound, composition containing same, and cured film thereof | DIC株式会社 | 2021-04-27 | — | — | CN | disclosed |
| CN-107848926-B | Novolac type phenolic hydroxyl group-containing resin and resist film | DIC株式会社 | 2021-04-20 | — | — | CN | disclosed |
| CN-106795077-B | Naphthol calixarene compound, process for producing the same, photosensitive composition, resist material, and coating film | DIC株式会社 | 2021-03-30 | — | — | CN | disclosed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | disclosed |
| US-9765175-B2 | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | DIC CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170260315-A1 | NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM | DIC CORPORATION (JP) | 2017-09-14 | — | — | US | disclosed |
| US-20170082923-A1 | PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND COATING FILM | DIC CORPORATION (JP) | 2017-03-23 | — | — | US | disclosed |
| US-20170066703-A1 | COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM | DIC CORPORATION (JP) | 2017-03-09 | — | — | US | disclosed |
| US-20160177020-A1 | MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING | DIC CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160017083-A1 | MODIFIED NOVOLAC PHENOL RESIN, RESIST MATERIAL, COATING FILM, AND RESIST PERMANENT FILM | DAINIPPON INK & CHEMICALS (JP) | 2016-01-21 | — | — | US | disclosed |
| CN-100441568-C | Aminocyclohexyl ether compounds and uses thereof | CARDIOME PHARMA CORP (CA) | 2008-12-10 | — | — | CN | disclosed |
| CN-1780817-A | Aminocyclohexyl ether compounds and uses thereof | CARDIOME PHARMA CORP (CA) | 2006-05-31 | — | — | CN | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170066703-A1 | COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM | PAH, TYR, HACL2 | CYP1A2 296/4885CYP2C19 195/4885CYP2C9 190/4885 |
| US-20170260315-A1 | NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM | FARSA, FARSB, ASH2L | CYP1A2 865/4885CYP2C19 1363/4885CYP2C9 782/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.