SCHEMBL6422026

SCHEMBL6422026

CC(COC(=O)C1=CC2CCC1C2)[Si](C)(C)C

nearest known ligand 0.37

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4247813 0.78 TSHR (0.38) CYP19A1
SCHEMBL4080277 0.76 CYP19A1 (0.38) CYP19A1
SCHEMBL5918209 0.75 CYP19A1 (0.37) CYP19A1
SCHEMBL7122610 0.74 MAPK1 (0.39) CYP19A1
SCHEMBL5918194 0.73 CYP19A1 (0.36) CYP19A1
SCHEMBL3763541 0.73 TP53 (0.41) CYP19A1
SCHEMBL2350191 0.73 TSHR (0.44)
SCHEMBL7120654 0.73 CYP19A1 (0.34) CYP19A1
SCHEMBL996860 0.73 SLC6A3 (0.40) CYP19A1
SCHEMBL31064743 0.73 SLC6A3 (0.40) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6887649-B2 Multi-layered resist structure and manufacturing method of semiconductor device FUJITSU LIMITED (JP) 2005-05-03 US disclosed
US-20020192595-A1 Multi-layered resist structure and manufacturing method of semiconductor device FUJITSU LIMITED (JP) 2002-12-19 US disclosed