⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3321042 | 0.77 | CYP1A2 (0.56) | — | |
| SCHEMBL1149394 | 0.73 | IDO1 (0.58) | — | |
| SCHEMBL143961 | 0.73 | CYP1A2 (0.68) | — | |
| SCHEMBL11288839 | 0.73 | CYP1A2 (0.68) | — | |
| SCHEMBL11410252 | 0.73 | IDO1 (0.58) | — | |
| SCHEMBL40574 | 0.71 | — | — | |
| SCHEMBL5188672 | 0.71 | — | — | |
| SCHEMBL5497395 | 0.71 | IDO1 (0.55) | — | |
| P-Xylene SCHEMBL11770184 | 0.71 | ACHE (1.00) | — | |
| P-Xylene SCHEMBL771 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2688917-A2 | HYDROSILYATION OF VINYL MACROMERS WITH METALLOCENES | Exxonmobil Chemical Patents Inc. (US) | 2014-01-29 | — | — | EP | disclosed |
| US-8501894-B2 | Hydrosilyation of vinyl macromers with metallocenes | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2013-08-06 | — | — | US | disclosed |
| WO-2012134726-A2 | HYDROSILYATION OF VINYL MACROMERS WITH METALLOCENES | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2012-10-04 | — | — | WO | disclosed |
| US-20120245300-A1 | Hydrosilyation Of Vinyl Macromers With Metallocenes | EXXONMOBIL CHEMICAL PATENTS INC. | 2012-09-27 | — | — | US | disclosed |
| US-7868407-B2 | Substrate comprising a lower silicone resin film and an upper silicone resin film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-11 | — | — | US | disclosed |
| US-7642043-B2 | Rework process for photoresist film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-7638268-B2 | Rework process for photoresist film | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-7585613-B2 | comprising light absorbing silicone resin, acid generator generates acid upon exposure to radiation; photoresist pattern cover the antireflection film with a vertical wall profile, without intermixing, less damage to an underlying layer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-08 | — | — | US | disclosed |
| US-7303785-B2 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20070172759-A1 | Antireflection film composition, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-0551771-B1 | Process for producing polysilanes | NIPPON OIL CO LTD (JP) | 1997-07-30 | — | — | EP | disclosed |
| US-5620531-A | Photovoltaic element | NIPPON OIL CO., LTD. (JP) | 1997-04-15 | — | — | US | disclosed |
| EP-0717451-A2 | Photovoltaic element | NIPPON OIL CO., LTD. (JP) | 1996-06-19 | — | — | EP | disclosed |
| EP-0630933-A2 | A method of producing a semiconducting material | NIPPON OIL CO. LTD. (JP) | 1994-12-28 | — | — | EP | disclosed |
| US-5304622-A | Process for producing polysilanes | NIPPON OIL COMPANY, LTD. (JP) | 1994-04-19 | — | — | US | disclosed |
| US-5262260-A | Photoreceptor containing carrier transport with polysilane and phenylene diamine | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0551771-A2 | Process for producing polysilanes | NIPPON OIL CO. LTD. (JP) | 1993-07-21 | — | — | EP | disclosed |
| US-5130214-A | Method for producing electrophotographic photoreceptor and apparatus used therefor | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1992-07-14 | — | — | US | disclosed |
| US-5094930-A | ELECTROPHOTOGRAPHIC PHOTORECEPTOR | KONICA CORPORATION (JP) | 1992-03-10 | — | — | US | disclosed |
| US-5082959-A | Oxidation of alkyl groups substituted on a trialkylsilyl-substituted aromatic ring using oxygen gas and a cobalt and/or manganese compound and a bromide as catalyts | AMOCO CORPORATION (US) | 1992-01-21 | — | — | US | disclosed |