Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 12/20 | 0.65 |
| ▸ | HSP90AB1 | P08238 | 2/20 | 0.59 |
| ▸ | NPC1 | O15118 | 1/20 | 0.54 |
| ▸ | RAB9A | P51151 | 1/20 | 0.54 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.50 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2190939 | 0.83 | HSP90AB1 (0.82) | CYP19A1HSP90AB1NPC1RAB9AHRH4 | |
| SCHEMBL1715655 | 0.80 | CYP19A1 (0.70) | CYP19A1HSP90AB1NPC1RAB9AHRH4 | |
| SCHEMBL84637 | 0.79 | CYP19A1 (1.00) | CYP19A1HSP90AB1PTGS2 | |
| SCHEMBL28676360 | 0.78 | CYP19A1 (0.66) | CYP19A1HSP90AB1NPC1RAB9AHRH4 | |
| SCHEMBL12673479 | 0.78 | CYP19A1 (0.76) | CYP19A1HSP90AB1NPC1RAB9APTGS2 | |
| SCHEMBL28329956 | 0.77 | CYP19A1 (0.62) | CYP19A1HSP90AB1NPC1RAB9A | |
| SCHEMBL14680115 | 0.76 | CYP19A1 (0.82) | CYP19A1HSP90AB1RAB9APTGS2 | |
| SCHEMBL3103838 | 0.76 | CYP19A1 (0.68) | CYP19A1HSP90AB1NPC1RAB9AHRH4 | |
| SCHEMBL12022159 | 0.76 | KCNMA1 (0.69) | CYP19A1HSP90AB1NPC1RAB9AHRH4 | |
| SCHEMBL3766130 | 0.75 | HSP90AB1 (0.66) | CYP19A1HSP90AB1NPC1RAB9AHRH4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1517972-A1 | METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD | Showa Denko K.K. (JP) | 2005-03-30 | — | — | EP | disclosed |
| WO-2003104350-A1 | METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD | SHOWA DENKO K.K. (JP) | 2003-12-18 | — | — | WO | disclosed |