SCHEMBL6435202

SCHEMBL6435202

CCCCCOC(O)CO

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.50
ALDH1A1 P00352 1/20 0.47
CNR1 P21554 1/20 0.47
CNR2 P34972 1/20 0.47
DNM1 Q05193 1/20 0.43
HTT P42858 2/20 0.41
MEN1 O00255 1/20 0.41
THRB P10828 1/20 0.41
KMT2A Q03164 1/20 0.41
MAPT P10636 1/20 0.41
SPHK1 Q9NYA1 1/20 0.40
LMNA P02545 1/20 0.39
MGAM O43451 1/20 0.38
LPAR6 P43657 1/20 0.38
LPAR1 Q92633 1/20 0.38
LPAR4 Q99677 1/20 0.38
LPAR5 Q9H1C0 1/20 0.38
LPAR2 Q9HBW0 1/20 0.38
LPAR3 Q9UBY5 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5834397 0.98 USP2 (0.53) USP2ALDH1A1CNR1CNR2DNM1
SCHEMBL2728818 0.98 USP2 (0.53) USP2ALDH1A1CNR1CNR2DNM1
SCHEMBL15935944 0.98 USP2 (0.53) USP2ALDH1A1CNR1CNR2DNM1
SCHEMBL30477515 0.98 USP2 (0.53) USP2ALDH1A1CNR1CNR2DNM1
SCHEMBL27615327 0.93 TSHR (0.42) USP2ALDH1A1CNR1CNR2DNM1
SCHEMBL565662 0.93
Iodide SCHEMBL27860357 0.91 TSHR (0.41) USP2ALDH1A1CNR1CNR2DNM1
SCHEMBL14374273 0.87 ALDH1A1 (0.63) ALDH1A1CNR1CNR2MEN1THRB
SCHEMBL3433294 0.87 ALDH1A1 (0.63) ALDH1A1CNR1CNR2MEN1THRB
SCHEMBL28831490 0.86 HTT (0.59) USP2HTTMEN1THRBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-59053835-A None JP disclosed
US-11958783-B2 Composition, film, and method for producing film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-04-16 US disclosed
US-20210278766-A1 COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-09 US disclosed
US-20200262760-A1 Composition, Film, and Method for Producing Film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-08-20 US disclosed
EP-3686262-A1 COMPOSITION, MEMBRANE, AND METHOD FOR PRODUCING MEMBRANE Sumitomo Chemical Company Limited (JP) 2020-07-29 EP disclosed
CN-111108172-A Composition, film, and method for producing film 住友化学株式会社 2020-05-05 CN disclosed
CN-103930108-B (Bacterio)chlorophyll photosensitizers for treatment of eye diseases and disorders 耶达研究开发公司 2017-05-24 CN disclosed
CN-103930108-A (Bacterio)chlorophyll photosensitizers for treatment of eye diseases and disorders YEDA RES & DEV 2014-07-16 CN disclosed
US-20050044778-A1 Fuel compositions employing catalyst combustion structure OCTANE INTERNATIONAL, LTD. 2005-03-03 US disclosed
JP-S5953835-A WATER-SOLUBLE PHOTOHARDENABLE RESIN COMPOSITION NIPPON OIL & FATS CO LTD 1984-03-28 JP disclosed