SCHEMBL6438296

SCHEMBL6438296

NCCCCCn1nc2ccccc2n1.On1nnc2ccccc21

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.57
MAPK1 P28482 1/20 0.57
ATM Q13315 1/20 0.57
SLC9A1 P19634 8/20 0.43
MAPT P10636 4/20 0.41
DGAT1 O75907 1/20 0.39
KEAP1 Q14145 1/20 0.38
ALDH1A1 P00352 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
THPO P40225 1/20 0.38
CYP4Z1 Q86W10 1/20 0.38
CXCR4 P61073 1/20 0.37
EGLN3 Q9H6Z9 1/20 0.37
KDM4E B2RXH2 1/20 0.36
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
TLR8 Q9NR97 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL366356 0.82 MAPT (0.46) MAPTCXCR4TLR8
SCHEMBL18955096 0.82 POLB (0.62) POLBMAPK1ATMSLC9A1MAPT
Hexadecylamine SCHEMBL20214323 0.82 POLB (0.62) POLBMAPK1ATMSLC9A1MAPT
SCHEMBL8088119 0.81 MAPT (0.44) MAPTCXCR4TLR8
SCHEMBL6827564 0.77 POLB (0.95) POLBMAPK1ATMSLC9A1MAPT
SCHEMBL28094080 0.77 POLB (0.68) POLBMAPK1ATMSLC9A1MAPT
Hydroxyamine SCHEMBL27357627 0.75 POLB (0.91) POLBMAPK1ATMSLC9A1MAPT
SCHEMBL1012471 0.75 POLB (1.00) POLBMAPK1ATMSLC9A1MAPT
SCHEMBL3672275 0.75 POLB (1.00) POLBMAPK1ATMSLC9A1MAPT
SCHEMBL184 0.75 POLB (1.00) POLBMAPK1ATMSLC9A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140213498-A1 PHOTORESIST REMOVAL ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-07-31 US claimed
US-20140213498-A1 PHOTORESIST REMOVAL ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-07-31 US disclosed
US-8236485-B2 Photoresist removal ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-08-07 US disclosed
EP-1583997-A2 PHOTORESIST REMOVAL ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2005-10-12 EP disclosed
US-20040180300-A1 wet-cleaning composition for removal of photoresist; comprises a strong base; an oxidant; and a polar solvent TRUIST BANK, AS NOTES COLLATERAL AGENT 2004-09-16 US disclosed
WO-2004059700-A2 PHOTORESIST REMOVAL ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2004-07-15 WO disclosed