SCHEMBL6439308

SCHEMBL6439308

O=C(Nc1ccccc1NC(=O)NC1CCCCC1)NC1CCCCC1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 1.00
SMN1; SMN2 Q16637 3/20 1.00
MEN1 O00255 1/20 1.00
HTT P42858 1/20 1.00
RAB9A P51151 3/20 0.79
NPC1 O15118 2/20 0.79
EPHX1 P07099 3/20 0.74
TP53 P04637 1/20 0.74
PKM P14618 1/20 0.73
EPHX2 P34913 4/20 0.72
KDM4E B2RXH2 3/20 0.70
ALDH1A1 P00352 1/20 0.68
MAPT P10636 1/20 0.67
TSHR P16473 1/20 0.66

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28651774 0.89 KMT2A (0.79) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL11336178 0.89 RAB9A (1.00) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL813710 0.89 KMT2A (0.79) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL7597346 0.89 KMT2A (0.79) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL1514659 0.88 EPHX1 (0.83) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL2752715 0.86 RAB9A (0.97) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL2751208 0.86 RAB9A (0.97) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL2751737 0.86 KMT2A (0.76) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL10089305 0.86 EPHX1 (1.00) KMT2ASMN1; SMN2MEN1HTTRAB9A
SCHEMBL7749911 0.85 KMT2A (0.72) KMT2ASMN1; SMN2MEN1HTTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7459014-B2 Radiation curable inks containing curable gelator additives XEROX CORPORATION (US) 2008-12-02 US disclosed
US-20050077648-A1 Solution casting method and polymer film FUJIFILM CORPORATION (JP) 2005-04-14 US disclosed