Benzenemethanethiol

Benzenemethanethiol

SCHEMBL6441042

C=COCC1CO1.SCc1ccccc1

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.45
IDO1 P14902 1/20 0.44
MGLL Q99685 4/20 0.40
ALDH1A1 P00352 3/20 0.38
GLA P06280 1/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
TSHR P16473 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HIF1A Q16665 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL1685814 0.83 ALDH1A1 (0.48) TDP1MGLLALDH1A1GLAMEN1
Toluene SCHEMBL3276598 0.81 ALDH1A1 (0.47) TDP1MGLLALDH1A1GLAMEN1
SCHEMBL6442605 0.78 TDP1 (0.43) TDP1MGLLALDH1A1GLAMEN1
SCHEMBL207666 0.77
Hydrochloric Acid SCHEMBL10941465 0.75
Fluoride SCHEMBL8522089 0.75
Methane SCHEMBL8676111 0.75
SCHEMBL8067870 0.73 TDP1 (0.50) TDP1MGLLALDH1A1GLAMEN1
Vinyl Chloride SCHEMBL11142319 0.72 ALDH1A1 (0.48) TDP1ALDH1A1TP53CYP3A4TSHR
SCHEMBL21055880 0.72 ALDH1A1 (0.59) TDP1ALDH1A1TP53CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1270645-B1 Resin for optical material MITSUBISHI GAS CHEMICAL CO (JP) 2005-12-14 EP disclosed
EP-0874016-B1 Novel resin for optical material MITSUBISHI GAS CHEMICAL CO (JP) 2003-08-20 EP disclosed
EP-1270645-A1 Resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-01-02 EP disclosed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US disclosed
EP-0874016-A2 Novel resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-10-28 EP disclosed