Toluene

Toluene

SCHEMBL3276598

C=COCC1CO1.Cc1ccccc1

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
GLA P06280 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
TSHR P16473 5/20 0.39
TP53 P04637 3/20 0.39
HIF1A Q16665 2/20 0.39
CYP3A4 P08684 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
MGLL Q99685 3/20 0.37
LMNA P02545 1/20 0.37
ALOX12 P18054 1/20 0.37
ACHE P22303 1/20 0.37
MAPT P10636 2/20 0.35
HPGD P15428 2/20 0.35
CYP1A2 P05177 1/20 0.35
PPARG P37231 1/20 0.35
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL1685814 0.86 ALDH1A1 (0.48) ALDH1A1GLATDP1MEN1KMT2A
Benzenemethanethiol SCHEMBL6441042 0.81 TDP1 (0.45) ALDH1A1GLATDP1MEN1KMT2A
Toluene SCHEMBL289971 0.80 TDP1 (0.55) ALDH1A1GLATDP1MEN1KMT2A
Toluene SCHEMBL9388822 0.80 TDP1 (0.55) ALDH1A1GLATDP1MEN1KMT2A
Toluene SCHEMBL9571021 0.80 TDP1 (0.55) ALDH1A1GLATDP1MEN1KMT2A
SCHEMBL6442605 0.80 TDP1 (0.43) ALDH1A1GLATDP1MEN1KMT2A
SCHEMBL207666 0.80
Toluene SCHEMBL20261899 0.79 TDP1 (0.53) ALDH1A1GLATDP1MEN1KMT2A
Hydrochloric Acid SCHEMBL10941465 0.78
Methane SCHEMBL8676111 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12441840-B2 Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same LG CHEM, LTD. (KR) 2025-10-14 US disclosed
US-11892772-B2 Binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same LG CHEM, LTD. (KR) 2024-02-06 US disclosed
US-20220365431-A1 BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME LG CHEM, LTD. (KR) 2022-11-17 US disclosed
US-20220348716-A1 COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME LG CHEM, LTD. (KR) 2022-11-03 US disclosed
US-10578967-B2 Resin composition, and display device comprising black bank manufactured by using same LG CHEM, LTD. (KR) 2020-03-03 US disclosed
US-20180180995-A1 RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK MANUFACTURED BY USING SAME LG CHEM, LTD. (KR) 2018-06-28 US disclosed
WO-2014017669-A1 NEAR INFRARED ABSORPTIVE LIQUID COMPOSITION, NEAR INFRARED CUT FILTER USING THE SAME, METHOD OF MANUFACTURING THE SAME, AND CAMERA MODULE AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2014-01-30 WO disclosed
US-20100085518-A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX LG CHEM, LTD. (KR) 2010-04-08 US disclosed
WO-2008102990-A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX LG CHEM, LTD. (KR) 2008-08-28 WO disclosed
EP-1270645-B1 Resin for optical material MITSUBISHI GAS CHEMICAL CO (JP) 2005-12-14 EP disclosed
US-6900157-B2 Process for production of partially hydrophilized porous adsorbents TOSOH CORPORATION (JP) 2005-05-31 US disclosed
EP-0874016-B1 Novel resin for optical material MITSUBISHI GAS CHEMICAL CO (JP) 2003-08-20 EP disclosed
US-20030050403-A1 Process for production of partially hydrophilized porous adsorbents TOSOH CORPORATION 2003-03-13 US disclosed
EP-1291080-A2 Process for production of partially hydrophilized porous adsorbents Tosoh Corporation (JP) 2003-03-12 EP disclosed
EP-1270645-A1 Resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-01-02 EP disclosed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US disclosed
EP-0874016-A2 Novel resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-10-28 EP disclosed