SCHEMBL6446033

SCHEMBL6446033

C=C(C(=O)O)C(CC)(CC)CCCC

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FDPS P14324 2/20 0.36
CYP4F2 P78329 1/20 0.35
CYP4A11 Q02928 1/20 0.35
ALOX15 P16050 2/20 0.33
AKR1B1 P15121 1/20 0.33
GGPS1 O95749 2/20 0.32
PPARG P37231 6/20 0.32
PPARD Q03181 6/20 0.32
PPARA Q07869 6/20 0.32
HDAC11 Q96DB2 5/20 0.32
TSHR P16473 4/20 0.32
GPR84 Q9NQS5 4/20 0.32
ALDH1A1 P00352 2/20 0.32
TLR2 O60603 2/20 0.32
TDP1 Q9NUW8 2/20 0.32
FABP4 P15090 2/20 0.32
PTPN1 P18031 2/20 0.32
SLC22A6 Q4U2R8 1/20 0.32
SLC22A8 Q8TCC7 1/20 0.32
MEN1 O00255 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6448587 0.94 FDPS (0.39) FDPSCYP4F2CYP4A11GGPS1
SCHEMBL6811305 0.91 FDPS (0.39) FDPSALOX15AKR1B1PPARGPPARD
Phosphine SCHEMBL27681919 0.89 FDPS (0.38) FDPSALOX15AKR1B1GGPS1PPARG
SCHEMBL11146828 0.86 EPHX1 (0.31) FDPSCYP4F2CYP4A11
SCHEMBL5419816 0.84 FDPS (0.42) FDPSALOX15
SCHEMBL2199441 0.84 ODC1 (0.36) FDPSCYP4F2CYP4A11HDAC11TSHR
SCHEMBL225787 0.83 GGPS1 (0.45) FDPSGGPS1
SCHEMBL6058687 0.83 GGPS1 (0.45) FDPSGGPS1
SCHEMBL6449919 0.82 TET2 (0.34) TSHR
SCHEMBL9167935 0.81 KDM4A (0.34) CYP4F2CYP4A11ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed