SCHEMBL6447273

SCHEMBL6447273

CCCCC(C)(C)/C=C(\C)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EP300 Q09472 1/20 0.34
FNTA P49354 2/20 0.33
FNTB P49356 2/20 0.33
THRB P10828 1/20 0.33
PGGT1B P53609 1/20 0.33
ALOX15 P16050 2/20 0.32
CA2 P00918 1/20 0.32
MAPK1 P28482 1/20 0.32
AKR1B1 P15121 1/20 0.32
HSD17B10 Q99714 2/20 0.32
LMNA P02545 1/20 0.32
GMNN O75496 1/20 0.32
USP2 O75604 1/20 0.32
CYP1A2 P05177 1/20 0.32
POLB P06746 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
APEX1 P27695 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6447275 1.00 EP300 (0.34) EP300FNTAFNTBTHRBPGGT1B
SCHEMBL5856231 0.94 EP300 (0.37) EP300FNTAFNTBTHRBPGGT1B
SCHEMBL15791892 0.92 EP300 (0.40) EP300FNTAFNTBTHRBPGGT1B
SCHEMBL15791978 0.92 EP300 (0.40) EP300FNTAFNTBTHRBPGGT1B
SCHEMBL3232588 0.88 ALDH1A1 (0.31) HSD17B10LMNAALDH1A1
SCHEMBL3232596 0.88 ALDH1A1 (0.31) HSD17B10LMNAALDH1A1
SCHEMBL27719327 0.81 FDPS (0.32) FDPSTSHRESR1
SCHEMBL3621930 0.79 PTGS1 (0.31)
SCHEMBL1469906 0.79 PTGS1 (0.31)
SCHEMBL703897 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed