SCHEMBL6450423

SCHEMBL6450423

C=C(C(=O)O)C(C)(CC)CCCCC

nearest known ligand 0.40

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
FDPS P14324 11/20 0.38
GGPS1 O95749 7/20 0.38
CES2 O00748 1/20 0.36
LPAR1 Q92633 1/20 0.36
LPAR3 Q9UBY5 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6025772 0.94 FDPS (0.35) FDPSGGPS1
SCHEMBL6026743 0.86 TET2 (0.33) FDPS
Acetic Acid SCHEMBL28291052 0.82 TET2 (0.31) FDPS
SCHEMBL6445901 0.81 TET2 (0.38)
SCHEMBL3775749 0.80 GGPS1 (0.45) FDPSGGPS1CES2LPAR1LPAR3
SCHEMBL12860397 0.79 TSHR (0.41) CES2
SCHEMBL1397979 0.79 TSHR (0.41) CES2
SCHEMBL6448587 0.78 FDPS (0.39) FDPSGGPS1CES2
SCHEMBL14245484 0.78 GGPS1 (0.48) FDPSGGPS1CES2LPAR1LPAR3
SCHEMBL20915417 0.78 CES2 (0.44) GGPS1CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2686393-B1 INKJET INK, INKJET RECORDING METHOD, AND INKJET RECORDING DEVICE RICOH CO LTD (JP) 2018-02-07 EP disclosed
US-9028600-B2 Inkjet ink, inkjet recording method, and inkjet recording device RICOH COMPANY, LTD. (JP) 2015-05-12 US disclosed
EP-2686393-A1 INKJET INK, INKJET RECORDING METHOD, AND INKJET RECORDING DEVICE Ricoh Company Ltd. (JP) 2014-01-22 EP disclosed
US-20140002539-A1 INKJET INK, INKJET RECORDING METHOD, AND INKJET RECORDING DEVICE RICOH COMPANY, LTD. (JP) 2014-01-02 US disclosed
WO-2012124790-A1 INKJET INK, INKJET RECORDING METHOD, AND INKJET RECORDING DEVICE RICOH COMPANY, LTD. (JP) 2012-09-20 WO disclosed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed