Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 1/20 | 0.41 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.41 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 5/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31211141 | 0.83 | CES1 (0.38) | TSHRCA1CA2THRB | |
| SCHEMBL29165694 | 0.83 | CES1 (0.38) | TSHRCA1CA2THRB | |
| SCHEMBL9217464 | 0.82 | ADRB2 (0.41) | ADRB2ADRB1ADRB3TSHRCYP3A4 | |
| SCHEMBL918859 | 0.82 | — | — | |
| SCHEMBL646707 | 0.81 | — | — | |
| SCHEMBL23701018 | 0.80 | — | — | |
| SCHEMBL25328425 | 0.80 | ADRB2 (0.39) | ADRB2ADRB1ADRB3TSHRCYP3A4 | |
| SCHEMBL28564758 | 0.78 | GBA1 (0.38) | TSHRCA1CA2THRB | |
| SCHEMBL28310552 | 0.78 | GBA1 (0.38) | TSHRCA1CA2THRB | |
| SCHEMBL49555 | 0.75 | ADRB2 (0.45) | ADRB2ADRB1ADRB3TSHRCYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8216649-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2012-07-10 | — | — | US | claimed |
| US-5334552-A | Forming wiring layer over dielectric film on substrate surface covering with silicon dioxide film, then forming fluorine-containing silicon dioxide and flattening films, dry etching of flattening film | NEC CORPORATION (JP) | 1994-08-02 | — | — | US | claimed |
| CN-118613545-A | Mixed composition, film obtained by curing the mixed composition, and glass having the film | 住友化学株式会社 | 2024-09-06 | — | — | CN | disclosed |
| WO-2023145301-A1 | MIXED COMPOSITION, CURED FILM OF SAID MIXED COMPOSITION, AND GLASS HAVING SAID FILM | 住友化学株式会社 | 2023-08-03 | — | — | WO | disclosed |
| EP-3239111-B1 | CURABLE COMPOSITION, TRANSFER FILM, FRONT PLATE OF IMAGE DISPLAY DEVICE, FRONT PLATE-INTEGRATED SENSOR, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD FOR FRONT PLATE OF IMAGE DISPLAY DEVICE | FUJIFILM CORP (JP) | 2021-02-17 | — | — | EP | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-3239111-A1 | CURABLE COMPOSITION, TRANSFER FILM, FRONT PLATE OF IMAGE DISPLAY DEVICE, FRONT PLATE-INTEGRATED SENSOR, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD FOR FRONT PLATE OF IMAGE DISPLAY DEVICE | FUJIFILM Corporation (JP) | 2017-11-01 | — | — | EP | disclosed |
| US-9268451-B2 | Transfer film, manufacturing method of capacitive input device, capacitive input device, and image display device including the same | FUJIFILM CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| EP-2182405-B1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | JSR CORP (JP) | 2016-01-13 | — | — | EP | disclosed |
| US-9050624-B2 | Film-forming composition for imprinting, method of manufacturing a structure, and structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| WO-2015064773-A1 | PHOTOCATALYTIC COATING AND METHOD OF MAKING SAME | NITTO DENKO CORPORATION (JP) | 2015-05-07 | — | — | WO | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| US-5468682-A | Method of manufacturing semiconductor device using the abrasive | NEC CORPORATION (JP) | 1995-11-21 | — | — | US | disclosed |
| US-5399529-A | Process for producing semiconductor devices | NEC CORPORATION (JP) | 1995-03-21 | — | — | US | disclosed |
| US-5334552-A | Forming wiring layer over dielectric film on substrate surface covering with silicon dioxide film, then forming fluorine-containing silicon dioxide and flattening films, dry etching of flattening film | NEC CORPORATION (JP) | 1994-08-02 | — | — | US | disclosed |