SCHEMBL6463009

SCHEMBL6463009

CCCC(Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 1/20 0.43
PPARG P37231 2/20 0.42
PPARA Q07869 2/20 0.42
LTA4H P09960 4/20 0.41
CA4 P22748 1/20 0.39
MTNR1A P48039 1/20 0.38
MTNR1B P49286 1/20 0.38
LMNA P02545 2/20 0.38
POLB P06746 1/20 0.37
ALDH1A1 P00352 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
AOC3 Q16853 1/20 0.36
KDM4C Q9H3R0 1/20 0.36
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10596081 0.91 SLC6A4 (0.41) SLC6A4PPARGPPARALTA4HCA4
SCHEMBL5287783 0.90 CA4 (0.52) PPARGPPARALTA4HCA4ALDH1A1
SCHEMBL11139896 0.90 SLC6A4 (0.40) SLC6A4PPARGPPARALTA4HCA4
SCHEMBL1579516 0.88 SLC6A4 (0.39) SLC6A4PPARGPPARALTA4HMTNR1A
SCHEMBL17139811 0.88 SLC6A4 (0.39) SLC6A4PPARGPPARALTA4HCA4
SCHEMBL4453544 0.87 LTA4H (0.47) SLC6A4PPARGPPARALTA4HLMNA
Bromide SCHEMBL25265560 0.86 SLC6A4 (0.38) SLC6A4PPARGPPARALTA4HCA4
Hydrochloric Acid SCHEMBL25206407 0.86 SLC6A4 (0.38) SLC6A4PPARGPPARALTA4HCA4
SCHEMBL2993982 0.86 TTR (0.40) SLC6A4PPARGPPARALTA4H
SCHEMBL29203855 0.86 SMN1; SMN2 (0.40) SLC6A4PPARGPPARALTA4HALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1067157-A1 Ink composition for a meltable ink and a method of printing a substrate with such an ink composition Océ-Technologies B.V. (NL) 2001-01-10 EP claimed
EP-1085029-B1 Process for polymerizing a methacrylic ester or an acrylic ester KURARAY CO (JP) 2005-12-14 EP disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed
US-4223169-A Process for polybrominating bisphenoxyalkanes FERRO CORPORATION (US) 1980-09-16 US disclosed