⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706690 | 0.94 | — | — | |
| SCHEMBL13089574 | 0.92 | — | — | |
| SCHEMBL557561 | 0.91 | — | — | |
| SCHEMBL929338 | 0.91 | — | — | |
| SCHEMBL13430609 | 0.91 | — | — | |
| SCHEMBL12898588 | 0.89 | — | — | |
| SCHEMBL1886778 | 0.89 | — | — | |
| SCHEMBL1567062 | 0.88 | TSHR (0.32) | — | |
| SCHEMBL331543 | 0.87 | — | — | |
| SCHEMBL3913135 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240199515-A1 | ULTRAVIOLET RAY IRRADIATION DEVICE, AND METHOD FOR PURIFYING ORGANIC COMPOUND | TOKUYAMA CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-4328214-A1 | ULTRAVIOLET RAY IRRADIATION DEVICE, AND METHOD FOR PURIFYING ORGANIC COMPOUND | Tokuyama Corporation (JP) | 2024-02-28 | — | — | EP | disclosed |
| CN-116963829-A | Ultraviolet irradiation device and method for purifying organic compound | 株式会社德山 | 2023-10-27 | — | — | CN | disclosed |
| WO-2022224951-A1 | ULTRAVIOLET RAY IRRADIATION DEVICE, AND METHOD FOR PURIFYING ORGANIC COMPOUND | 株式会社トクヤマ | 2022-10-27 | — | — | WO | disclosed |
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-9437431-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-06 | — | — | US | disclosed |
| EP-1720075-B1 | Coating compositions | ROHM & HAAS ELECT MAT (US) | 2016-03-02 | — | — | EP | disclosed |
| US-20150072290-A1 | COATING COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-03-12 | — | — | US | disclosed |
| US-8911927-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-12-16 | — | — | US | disclosed |
| US-8889344-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-11-18 | — | — | US | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20030008244-A1 | Porous optical materials | SHIPLEY COMPANY, L.L.C. (US) | 2003-01-09 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1265080-A2 | Porous optical materials | Shipley Company LLC (US) | 2002-12-11 | — | — | EP | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |