SCHEMBL647363

SCHEMBL647363

COc1cc(C=CC(=O)O)c(C(C)CC[SiH2]C(O[Si](C)(C)C)O[Si](C)(C)C)c(OC)c1OC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 11/20 0.40
ALDH1A1 P00352 9/20 0.40
HPGD P15428 5/20 0.40
HSD17B10 Q99714 2/20 0.40
HTR1A P08908 1/20 0.40
HTR2C P28335 1/20 0.40
MAPT P10636 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA4 P22748 1/20 0.37
CA6 P23280 1/20 0.37
CA5A P35218 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
CA5B Q9Y2D0 1/20 0.37
HTT P42858 2/20 0.37
CYP2C9 P11712 1/20 0.36
SMN1; SMN2 Q16637 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL647361 1.00 KDM4E (0.40) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL9119854 0.88 KDM4E (0.43) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL9119863 0.88 KDM4E (0.43) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL645501 0.82 KDM4E (0.41) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL645499 0.82 KDM4E (0.41) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL9440571 0.81 KDM4E (0.41) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL9440557 0.81 KDM4E (0.41) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL6675229 0.79 KDM4E (0.39) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL6675232 0.79 KDM4E (0.39) KDM4EALDH1A1HPGDHSD17B10HTR1A
SCHEMBL647484 0.77 KDM4E (0.41) KDM4EALDH1A1HPGDHSD17B10HTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12383476-B2 W/O/W emulsion composition SHISEIDO COMPANY, LTD. (JP) 2025-08-12 US disclosed
WO-2024142969-A1 WATER-IN-OIL EMULSION COMPOSITION 株式会社 資生堂 2024-07-04 WO disclosed
WO-2024080367-A1 POLYSILOXANE-COATED METAL OXIDE PARTICLES, DISPERSION LIQUID, COMPOSITION, COSMETIC, AND METHOD FOR PRODUCING POLYSILOXANE-COATED METAL OXIDE PARTICLES 住友大阪セメント株式会社 2024-04-18 WO disclosed
WO-2023210618-A1 SURFACE-TREATED ZINC OXIDE PARTICLES, DISPERSION LIQUID, COSMETIC MATERIAL, METHOD FOR PRODUCING SURFACE-TREATED ZINC OXIDE PARTICLES 住友大阪セメント株式会社 2023-11-02 WO disclosed
WO-2023190487-A1 SURFACE-MODIFIED ZINC OXIDE PARTICLES, DISPERSION LIQUID AND COSMETIC PREPARATION 住友大阪セメント株式会社 2023-10-05 WO disclosed
WO-2023145102-A1 ZINC OXIDE POWDER, LIQUID DISPERSION, COATING MATERIAL, AND COSMETIC 住友大阪セメント株式会社 2023-08-03 WO disclosed
US-20220362112-A1 W/O/W EMULSION COMPOSITION SHISEIDO COMPANY, LTD. (JP) 2022-11-17 US disclosed
WO-2022177004-A1 SURFACE-MODIFIED ZINC OXIDE PAPRTICLES, DISPERSION LIQUID, COSMETIC PREPARATION, AND METHOD FOR PRODUCING SURFACE-MODIFIED ZINC OXIDE PARTICLES 住友大阪セメント株式会社 2022-08-25 WO disclosed
US-20180161255-A1 SILICON OXIDE-COATED ZINC OXIDE, COMPOSITION CONTAINING SILICON OXIDE-COATED ZINC OXIDE, AND COSMETIC PRODUCT SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2018-06-14 US disclosed
US-8119108-B2 Dispersion of microparticulate titanium oxide and cosmetics containing the same SHISEIDO CO., LTD. (JP) 2012-02-21 US disclosed
EP-0350314-B1 Silicone type cinnamic acid derivative, preparation method thereof, uv-ray absorber, and external skin treatment agent. SHISEIDO CO LTD (JP) 1995-12-13 EP disclosed
US-5315022-A Sunscreen SHISEIDO COMPANY LTD. (JP) 1994-05-24 US disclosed
US-5093511-A SILICONE TYPE CINNAMIC ACID DERIVATIVE, PREPARATION METHOD THEREOF, UV-RAY ABSORBER, AND EXTERNAL SKIN TREATMENT AGENT SHISEIDO COMPANY, LTD. (JP) 1992-03-03 US disclosed
EP-0350314-A2 Silicone type cinnamic acid derivative, preparation method thereof, uv-ray absorber, and external skin treatment agent. SHISEIDO COMPANY LIMITED (JP) 1990-01-10 EP disclosed