⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29076010 | 0.79 | — | — | |
| SCHEMBL29543809 | 0.76 | — | — | |
| SCHEMBL1191187 | 0.73 | — | — | |
| SCHEMBL1191186 | 0.73 | — | — | |
| SCHEMBL5139541 | 0.72 | — | — | |
| SCHEMBL6542875 | 0.72 | — | — | |
| SCHEMBL2755690 | 0.67 | — | — | |
| SCHEMBL11678880 | 0.67 | — | — | |
| SCHEMBL11678877 | 0.67 | — | — | |
| SCHEMBL22618954 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117492326-B | Low-viscosity nano-imprint photoresist and preparation method thereof | 青岛天仁微纳科技有限责任公司 | 2024-08-09 | — | — | CN | claimed |
| CN-117492326-A | Low-viscosity nano-imprint photoresist and preparation method thereof | 青岛天仁微纳科技有限责任公司 | 2024-02-02 | — | — | CN | claimed |
| CN-112898119-A | Preparation method of 3-hydroxyethyl hexafluoroisopropanol and acid catalysis device thereof | 宁波南大光电材料有限公司 | 2021-06-04 | — | — | CN | claimed |
| US-20100266958-A1 | RESIST MATERIAL AND METHOD FOR FORMING PATTERN USING THE SAME | PANASONIC CORPORATION (JP) | 2010-10-21 | — | — | US | claimed |
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | claimed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | claimed |
| EP-0527020-B1 | Novel fluorinated glycidyl ethers and method of making them | SHINETSU CHEMICAL CO (JP) | 1995-04-12 | — | — | EP | claimed |
| EP-0527020-A1 | Novel fluorinated glycidyl ethers and method of making them | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-02-10 | — | — | EP | claimed |
| JP-5171114-A | — | — | None | — | — | JP | disclosed |
| JP-5238988-A | — | — | None | — | — | JP | disclosed |
| CN-120025651-A | High-barrier puncture-resistant food packaging film and preparation method thereof | 潮州市潮安区恒昌印制有限公司 | 2025-05-23 | — | — | CN | disclosed |
| CN-119431706-A | Fatigue-resistant polyurethane elastomer and preparation method and application thereof | 万勋科技(深圳)有限公司 | 2025-02-14 | — | — | CN | disclosed |
| CN-117492326-B | Low-viscosity nano-imprint photoresist and preparation method thereof | 青岛天仁微纳科技有限责任公司 | 2024-08-09 | — | — | CN | disclosed |
| CN-117492326-A | Low-viscosity nano-imprint photoresist and preparation method thereof | 青岛天仁微纳科技有限责任公司 | 2024-02-02 | — | — | CN | disclosed |
| JP-H05238988-A | FLUORINE-CONTAINING ORGANIC COMPOUND AND ITS PRODUCTION | SHIN ETSU CHEM CO LTD | 1993-09-17 | — | — | JP | disclosed |
| US-5227502-A | Unsaturated monomers for homo- or copolpolymers, silane coupling agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-07-13 | — | — | US | disclosed |
| US-5227502-A | Unsaturated monomers for homo- or copolpolymers, silane coupling agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-07-13 | — | — | US | disclosed |
| JP-H05171114-A | PRIMER COMPOSITION | SHIN ETSU CHEM CO LTD | 1993-07-09 | — | — | JP | disclosed |
| EP-0549335-A1 | Primer compositions | Shin-Etsu Chemical Co., Ltd. (JP) | 1993-06-30 | — | — | EP | disclosed |
| EP-0527020-A1 | Novel fluorinated glycidyl ethers and method of making them | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-02-10 | — | — | EP | disclosed |