⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2148561 | 0.67 | — | — | |
| SCHEMBL559834 | 0.65 | — | — | |
| SCHEMBL9646996 | 0.65 | — | — | |
| SCHEMBL176754 | 0.65 | — | — | |
| SCHEMBL6372840 | 0.64 | — | — | |
| SCHEMBL4386797 | 0.64 | — | — | |
| SCHEMBL10632960 | 0.62 | — | — | |
| SCHEMBL14893421 | 0.61 | ALDH1A1 (0.35) | — | |
| SCHEMBL22151858 | 0.60 | — | — | |
| SCHEMBL5188375 | 0.60 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 523 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3435160-B1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YOUNG CHANG CHEMICAL CO LTD (KR) | 2022-05-04 | — | — | EP | claimed |
| WO-2024128190-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024128157-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-20240192591-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-12001139-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-20240176238-A1 | SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240176235-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-118103774-A | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and pattern forming method | 信越化学工业株式会社 | 2024-05-28 | — | — | CN | disclosed |
| US-11994799-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| US-20040241577-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| US-20040185372-A1 | Dye-containing curable composition, color filter, and process of preparing color filter | FUJI PHOTO FILM CO., LTD. | 2004-09-23 | — | — | US | disclosed |
| US-20040009414-A1 | Dye-containing curable composition, color filter and method of manufacturing the same | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-20030232259-A1 | Dye-containing curable composition, color filter, and producing process thereof | FUJI PHOTO FILM CO., LTD. | 2003-12-18 | — | — | US | disclosed |
| EP-0823661-B1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO LTD (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-5362721-A | Corticoid-17-alkyl-carbonates substituted in the 17-position, process for their preparation and pharmaceuticals containing them | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-11-08 | — | — | US | disclosed |
| EP-0590033-A1 | POLYESTER-BASED COATING COMPOSITIONS HAVING HIGH PIGMENT-TO-BINDER RATIOS | EXXON CHEMICAL PATENTS INC. (US) | 1994-04-06 | — | — | EP | disclosed |