SCHEMBL650782

SCHEMBL650782

Nc1ccc(Oc2c(C(F)(F)F)cc(C(c3cc(C(F)(F)F)c(Oc4ccc(N)cc4)c(C(F)(F)F)c3)(C(F)(F)F)C(F)(F)F)cc2C(F)(F)F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
TSHR P16473 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
CYP3A4 P08684 1/20 0.41
MAPT P10636 5/20 0.40
RAB9A P51151 3/20 0.40
NPC1 O15118 2/20 0.40
HPGD P15428 1/20 0.40
MAPK1 P28482 1/20 0.40
GAA P10253 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
POLB P06746 2/20 0.38
MEN1 O00255 1/20 0.38
MITF O75030 1/20 0.38
GFER P55789 1/20 0.38
KMT2A Q03164 1/20 0.38
NLRP1 Q9C000 1/20 0.38
NOD2 Q9HC29 1/20 0.38
GLA P06280 1/20 0.38
MAOB P27338 5/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21468659 0.93 AR (0.42) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL14223513 0.84 TSHR (0.48) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL29962772 0.83 ALDH1A1 (0.52) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL648768 0.82 ALDH1A1 (0.46) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL8405569 0.82 ALDH1A1 (0.36) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL8143487 0.81 TSHR (0.47) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL10715067 0.81 MAOB (0.43) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL1352268 0.81 MAPT (0.43) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL4847389 0.79 ALDH1A1 (0.36) ALDH1A1TSHRTDP1CYP3A4MAPT
SCHEMBL8970419 0.77 ALDH1A1 (0.59) ALDH1A1TSHRTDP1CYP3A4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 336 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7459047-B2 Preparation of flexible copper foil/polyimide laminate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-02 US claimed
US-5601905-A Laminate for insulation protection of circuit boards NIPPON STEEL CHEMICAL CO., LTD. (JP) 1997-02-11 US claimed
US-5399655-A Acid-labile poly(amic acetal ester) E. I. DU PONT DE NEMOURS AND COMPANY (US) 1995-03-21 US claimed
EP-3893054-B1 PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORP (JP) 2026-05-06 EP disclosed
EP-3633455-B1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2026-04-08 EP disclosed
EP-3859447-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2025-11-19 EP disclosed
US-12473403-B2 Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor FUJIFILM CORPORATION (JP) 2025-11-18 US disclosed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
US-20250264801-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-08-21 US disclosed
US-12393116-B2 Pattern forming method, photosensitive resin composition, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2025-08-19 US disclosed
EP-4596607-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
US-4939039-A Noncurlling, polyamideimides NIPPON STEEL CHEMICAL CO., LTD. (JP) 1990-07-03 US disclosed
EP-0355927-A2 A precursor of a low thermal stress polyimide and a photopolymerizable composition containing a polyimide precursor Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1990-02-28 EP disclosed
US-4847353-A POLYAMIDEIMIDE COPOLYMERS NIPPON STEEL CHEMICAL CO., LTD. (JP) 1989-07-11 US disclosed
EP-0297139-A1 FLEXIBLE PRINTED CIRCUIT BOARD AND PROCESS FOR ITS PRODUCTION NIPPON STEEL CHEMICAL CO., LTD. (JP) 1989-01-04 EP disclosed
US-4792476-A AROMATIC POLYIMIDES HITACHI, LTD. (JP) 1988-12-20 US disclosed
EP-0271736-A1 Resins of low thermal expansivity NIPPON STEEL CHEMICAL CO., LTD. (JP) 1988-06-22 EP disclosed
US-4690999-A MOLECULARLY-ORIENTED POLYIMIDES BASED ON PARA-AROMATIC DIAMINES; FILMS; PROTECTIVE COATINGS; INTEGRATED CIRCUITS HITACHI, LTD. (JP) 1987-09-01 US disclosed
US-4641924-A Liquid crystal device HITACHI, LTD. (JP) 1987-02-10 US disclosed
EP-0133533-A2 Low thermal expansion resin material for a wiring insulating film. HITACHI, LTD. (JP) 1985-02-27 EP disclosed