SCHEMBL648768

SCHEMBL648768

Cc1cc(C(c2cc(C)c(Oc3ccc(N)cc3)c(C)c2)(C(F)(F)F)C(F)(F)F)cc(C)c1Oc1ccc(N)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
MAPT P10636 5/20 0.44
RAB9A P51151 4/20 0.44
NPC1 O15118 3/20 0.44
MAPK1 P28482 2/20 0.44
HPGD P15428 1/20 0.44
TEAD4 Q15561 1/20 0.44
TDP1 Q9NUW8 3/20 0.43
POLB P06746 1/20 0.43
CYP3A4 P08684 1/20 0.42
TSHR P16473 1/20 0.42
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
MITF O75030 1/20 0.39
GAA P10253 1/20 0.39
GFER P55789 1/20 0.39
NLRP1 Q9C000 1/20 0.39
NOD2 Q9HC29 1/20 0.39
AR P10275 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21468659 0.91 AR (0.42) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL10715134 0.90 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL2989151 0.89 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL28882083 0.84 ALDH1A1 (0.43) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL8776970 0.83 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL650782 0.82 ALDH1A1 (0.41) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL1352268 0.82 MAPT (0.43) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL10715067 0.82 MAOB (0.43) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL8405668 0.81 ALDH1A1 (0.41) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1
SCHEMBL7610901 0.81 ALDH1A1 (0.49) ALDH1A1SMN1; SMN2MAPTRAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 377 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8119667-B2 Carbonates of fenicol antibiotics SCHERING-PLOUGH ANIMAL HEALTH CORPORATION (US) 2012-02-21 US claimed
EP-1966129-B1 CARBONATES OF FENICOL ANTIBIOTICS SCHERING PLOUGH LTD (CH) 2011-08-17 EP claimed
US-7459047-B2 Preparation of flexible copper foil/polyimide laminate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-02 US claimed
US-5601905-A Laminate for insulation protection of circuit boards NIPPON STEEL CHEMICAL CO., LTD. (JP) 1997-02-11 US claimed
US-5399655-A Acid-labile poly(amic acetal ester) E. I. DU PONT DE NEMOURS AND COMPANY (US) 1995-03-21 US claimed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US claimed
EP-3893054-B1 PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORP (JP) 2026-05-06 EP disclosed
EP-3633455-B1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2026-04-08 EP disclosed
EP-3859447-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2025-11-19 EP disclosed
US-12473403-B2 Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor FUJIFILM CORPORATION (JP) 2025-11-18 US disclosed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
US-20250264801-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-08-21 US disclosed
US-12393116-B2 Pattern forming method, photosensitive resin composition, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2025-08-19 US disclosed
US-4641924-A Liquid crystal device HITACHI, LTD. (JP) 1987-02-10 US disclosed
EP-0032745-B1 ETHER IMIDES AND PROCESS FOR PRODUCING THE SAME Hitachi, Ltd. (JP) 1987-01-07 EP disclosed
EP-0047530-B1 MALEIMIDE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION Hitachi, Ltd. (JP) 1986-12-10 EP disclosed
US-4460783-A AMIDATION, CYCLIZATION, DEHYDRATION HITACHI, LTD. (JP) 1984-07-17 US disclosed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US disclosed
EP-0047530-A2 Maleimide resin composition and process for its production Hitachi, Ltd. (JP) 1982-03-17 EP disclosed
EP-0032745-A2 Ether imides and process for producing the same Hitachi, Ltd. (JP) 1981-07-29 EP disclosed