SCHEMBL6510495

SCHEMBL6510495

C=Cc1ccccc1O.C=Cc1ccccc1OCC(=O)OC(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.42
PTGDR2 Q9Y5Y4 1/20 0.40
MAPT P10636 6/20 0.39
NPSR1 Q6W5P4 4/20 0.39
LMNA P02545 3/20 0.39
HPGD P15428 3/20 0.39
ALDH1A1 P00352 3/20 0.39
NPC1 O15118 2/20 0.39
MAPK1 P28482 2/20 0.39
RAB9A P51151 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
S1PR4 O95977 1/20 0.39
ITGA4 P13612 1/20 0.39
S1PR1 P21453 1/20 0.39
TLR9 Q9NR96 1/20 0.39
POLB P06746 2/20 0.39
DDB1 Q16531 1/20 0.39
CRBN Q96SW2 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1397119 0.93 USP2 (0.47) USP2PTGDR2MAPTNPSR1LMNA
SCHEMBL7197459 0.81 PTGDR2 (0.62) USP2PTGDR2MAPTNPSR1LMNA
SCHEMBL6512118 0.80 MAPT (0.40) USP2MAPTNPSR1LMNAHPGD
SCHEMBL22656552 0.79 POLB (0.50) USP2MAPTNPSR1LMNAHPGD
SCHEMBL5670875 0.78 MAPT (0.41) MAPTNPSR1LMNAHPGDALDH1A1
SCHEMBL5550084 0.76 MAPT (0.39) MAPTNPSR1LMNAHPGDALDH1A1
SCHEMBL17863711 0.74 PTGDR2 (0.51) USP2PTGDR2MAPTNPSR1LMNA
SCHEMBL2758527 0.74 DDB1 (0.45) USP2MAPTNPSR1LMNAHPGD
SCHEMBL6858822 0.74 MAPT (0.41) MAPTNPSR1LMNAHPGDALDH1A1
SCHEMBL22396691 0.74 POLB (0.46) USP2MAPTNPSR1LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6913873-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-07-05 US disclosed
US-20030087194-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-05-08 US disclosed