SCHEMBL6522497

SCHEMBL6522497

CCCCC(OCC)C(=O)O.[SrH2]

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 4/20 0.47
MAPK1 P28482 1/20 0.47
ACE2 Q9BYF1 1/20 0.41
GPR84 Q9NQS5 3/20 0.41
FFAR1 O14842 1/20 0.41
SLC1A3 P43003 1/20 0.40
SLC1A2 P43004 1/20 0.40
SLC1A1 P43005 1/20 0.40
MAPT P10636 1/20 0.39
LCK P06239 1/20 0.39
PPARD Q03181 1/20 0.39
ZDHHC20 Q5W0Z9 1/20 0.39
ZDHHC2 Q9UIJ5 1/20 0.39
PPARG P37231 3/20 0.39
PTGES O14684 1/20 0.39
ALOX5 P09917 1/20 0.39
PPARA Q07869 5/20 0.39
CA1 P00915 1/20 0.38
CHRM1 P11229 1/20 0.38
AKR1A1 P14550 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL448884 0.98 CA2 (0.48) CA2MAPK1ACE2GPR84FFAR1
SCHEMBL26940436 0.98 CA2 (0.48) CA2MAPK1ACE2GPR84FFAR1
SCHEMBL6517069 0.96 CA2 (0.47) CA2MAPK1GPR84FFAR1SLC1A3
SCHEMBL6521659 0.96 CA2 (0.47) CA2MAPK1GPR84FFAR1SLC1A3
SCHEMBL10728407 0.96 CA2 (0.47) CA2MAPK1GPR84FFAR1SLC1A3
SCHEMBL6521204 0.96 CA2 (0.47) CA2MAPK1GPR84FFAR1SLC1A3
SCHEMBL28245065 0.92 GPR84 (0.50) CA2MAPK1ACE2GPR84FFAR1
SCHEMBL28766385 0.90 GPR84 (0.53) CA2ACE2GPR84FFAR1MAPT
SCHEMBL8455146 0.90 GPR84 (0.53) CA2ACE2GPR84FFAR1MAPT
SCHEMBL11531633 0.90 GPR84 (0.53) CA2ACE2GPR84FFAR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6867452-B2 Interlayer oxide containing thin films for high dielectric constant application of the formula AB2O6 or AB2O7 SYMETRIX CORPORATION (US) 2005-03-15 US disclosed
US-6541279-B2 Tungsten- bronze-type oxides, pyrochlore-type oxides, and combinations of bismuth oxide with perovskites and pyrochlore-type oxide SYMETRIX CORPORATION 2003-04-01 US disclosed
US-20030052357-A1 Interlayer oxide containing thin films for high dielectric constant application SYMETRIX CORPORATION 2003-03-20 US disclosed
US-6495878-B1 Interlayer oxide containing thin films for high dielectric constant application SYMETRIX CORPORATION 2002-12-17 US disclosed
EP-1192648-A2 METAL OXIDE THIN FILMS FOR HIGH DIELECTRIC CONSTANT APPLICATIONS SYMETRIX CORPORATION (US) 2002-04-03 EP disclosed
US-20010012698-A1 Metal oxide thin films for high dielectric constant application SYMETRIX CORPORATION 2001-08-09 US disclosed
WO-2000077832-A2 METAL OXIDE THIN FILMS FOR HIGH DIELECTRIC CONSTANT APPLICATIONS SYMETRIX CORPORATION (US) 2000-12-21 WO disclosed