SCHEMBL65264

SCHEMBL65264

C=COCC(CO)(COC=C)COC=C

nearest known ligand 0.48

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
TP53 P04637 1/20 0.48
CYP3A4 P08684 1/20 0.48
MAPK1 P28482 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
HIF1A Q16665 1/20 0.48
TSHR P16473 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL271312 0.94 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL296631 0.94 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL23930414 0.91 ALDH1A1 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL295125 0.85 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL1412705 0.85 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL64661 0.82
SCHEMBL13113332 0.80 ALDH1A1 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL13708124 0.74
SCHEMBL8758399 0.74 ALDH1A1 (0.31) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL1412707 0.74 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1405 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4321561-A1 PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER LG Chem, Ltd. (KR) 2024-02-14 EP claimed
CN-117321120-A Method for producing superabsorbent polymer and superabsorbent polymer 株式会社LG化学 2023-12-29 CN claimed
WO-2022265475-A1 PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER 주식회사 엘지화학 2022-12-22 WO claimed
CN-115417954-A Photo-thermal dual-curable polyurethane polymer, preparation method and composite material thereof 万华化学(北京)有限公司 2022-12-02 CN claimed
WO-2022117389-A1 METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER BASF SE (DE) 2022-06-09 WO claimed
CN-108271380-B Antifouling composition 佐敦公司 2020-10-23 CN claimed
WO-2017009301-A1 ANTIFOULING COMPOSITION JOTUN A/S (NO) 2017-01-19 WO claimed
US-20100163812-A1 INK COMPOSITION FOR COLOR FILTER LG CHEM, LTD. (KR) 2010-07-01 US claimed
US-5939235-A PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE FUJI PHOTO FILM CO., LTD. (JP) 1999-08-17 US claimed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US claimed
EP-4400223-A1 DIGITAL EMBOSSING CREATION METHOD Sakata INX Corporation (JP) 2024-07-17 EP disclosed
WO-2024143461-A1 LAMINATE, ELECTRONIC DEVICE, COVER GLASS, AND RESIN COMPOSITION 積水化学工業株式会社 2024-07-04 WO disclosed
CN-118284511-A Laminate and electronic device 积水化学工业株式会社 2024-07-02 CN disclosed
US-20240210817-A1 RESIN MOLDED ARTICLE PRODUCTION METHOD AND OPTICAL COMPONENT PRODUCTION METHOD DAICEL CORPORATION (JP) 2024-06-27 US disclosed
WO-2024136394-A1 PREPARATION METHOD OF SUPER ABSORBENT POLYMER 주식회사 엘지화학 2024-06-27 WO disclosed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US disclosed
EP-0609684-A1 Positive-working light-sensitive composition Fuji Photo Film Co., Ltd. (JP) 1994-08-10 EP disclosed
EP-0536690-A1 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-04-14 EP disclosed
EP-0279005-A1 Semi-interpenetrating polymer networks ALLIED CORPORATION (US) 1988-08-24 EP disclosed
US-4654379-A VINYL ETHER AND CELLULOSE ESTER ALLIED CORPORATION (US) 1987-03-31 US disclosed