⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13708124 | 0.91 | — | — | |
| SCHEMBL17483284 | 0.88 | — | — | |
| Oxirane SCHEMBL1956861 | 0.86 | — | — | |
| SCHEMBL63256 | 0.82 | THRB (0.39) | — | |
| SCHEMBL296631 | 0.82 | ALDH1A1 (0.43) | — | |
| SCHEMBL65264 | 0.82 | ALDH1A1 (0.48) | — | |
| SCHEMBL271312 | 0.82 | ALDH1A1 (0.43) | — | |
| SCHEMBL13998559 | 0.82 | — | — | |
| SCHEMBL23930414 | 0.80 | ALDH1A1 (0.42) | — | |
| SCHEMBL17126851 | 0.80 | THRB (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2883 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4182375-B1 | RELEASABLE COMPOSITIONS BASED ON POLYACETALS | DELO INDUSTRIE KLEBSTOFFE GMBH & CO KGAA (DE) | 2026-05-20 | — | — | EP | claimed |
| US-12565560-B2 | Releasable compositions based on polyacetals | DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) | 2026-03-03 | — | — | US | claimed |
| US-20240254278-A1 | RELEASABLE COMPOSITIONS BASED ON POLYACETALS | DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) | 2024-08-01 | — | — | US | claimed |
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| EP-4377373-A1 | CURABLE, ONE-PART, DUAL-STAGE THIOL-ENE-EPOXY LIQUID ADHESIVES AND METHODS | 3M Innovative Properties Company (US) | 2024-06-05 | — | — | EP | claimed |
| CN-117813335-A | Curable one-part two-stage thiol-ene-epoxy liquid adhesives and methods | 3M创新有限公司 | 2024-04-02 | — | — | CN | claimed |
| EP-4321561-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | LG Chem, Ltd. (KR) | 2024-02-14 | — | — | EP | claimed |
| CN-117321120-A | Method for producing superabsorbent polymer and superabsorbent polymer | 株式会社LG化学 | 2023-12-29 | — | — | CN | claimed |
| US-20230242842-A1 | TREATMENT COMPOSITIONS | PROCTER & GAMBLE (US) | 2023-08-03 | — | — | US | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-7605209-B2 | Coating compositions containing reactive diluents and methods | VALSPAR SOURCING, INC. (US) | 2009-10-20 | — | — | US | claimed |
| US-20080171807-A1 | Two-component reaction resin and method of fastening using the resin | HILTI AKTIENGESELLSCHAFT (LI) | 2008-07-17 | — | — | US | claimed |
| US-6921454-B2 | Elastomer toughened radiation curable adhesives | HENKEL CORPORATION (US) | 2005-07-26 | — | — | US | claimed |
| US-6916890-B1 | Thermally reworkable epoxy resins and compositions based thereon | HENKEL CORPORATION (US) | 2005-07-12 | — | — | US | claimed |
| WO-2003031492-A1 | THERMALLY REWORKABLE EPOXY RESINS AND COMPOSITIONS BASED THEREO N | HENKEL CORPORATION (US) | 2003-04-17 | — | — | WO | claimed |
| WO-1999064484-A1 | POLYMERIZATION OF VINYL ETHERS | MOLTECH CORPORATION (US) | 1999-12-16 | — | — | WO | claimed |
| US-5939235-A | PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-17 | — | — | US | claimed |
| US-5369164-A | Adhesives | BASF AKTIENGESELLSCHAFT (DE) | 1994-11-29 | — | — | US | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| US-3933509-A | Photo-polymerizable composition containing an acid salt of an indolinobenzospiropyran | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-20 | — | — | US | claimed |