SCHEMBL6528131

SCHEMBL6528131

Cc1ccc(C)n1CC(C)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.44
MAPK1 P28482 2/20 0.41
ATM Q13315 1/20 0.41
ALDH1A1 P00352 3/20 0.39
MAPT P10636 3/20 0.39
PTGS1 P23219 1/20 0.38
PTGS2 P35354 1/20 0.38
ADORA2A P29274 1/20 0.38
ADORA2B P29275 1/20 0.38
ADORA1 P30542 1/20 0.38
MEN1 O00255 1/20 0.35
USP2 O75604 1/20 0.35
POLB P06746 1/20 0.35
GAA P10253 1/20 0.35
THRB P10828 1/20 0.35
NR4A1 P22736 1/20 0.35
APEX1 P27695 1/20 0.35
APOBEC3A P31941 1/20 0.35
RECQL P46063 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9093477 1.00 KDM4E (0.44) KDM4EMAPK1ATMALDH1A1MAPT
SCHEMBL21550306 0.76 KDM4E (0.39) KDM4EATMALDH1A1MAPTADORA2A
SCHEMBL16018353 0.76 KDM4E (0.39) KDM4EATMALDH1A1MAPTADORA2A
SCHEMBL15498265 0.76 KDM4E (0.39) KDM4EATMALDH1A1MAPTADORA2A
SCHEMBL9093914 0.75 KDM4E (0.33) KDM4EALDH1A1MAPTMEN1USP2
SCHEMBL9094123 0.75 KDM4E (0.33) KDM4EALDH1A1MAPTMEN1USP2
SCHEMBL14830413 0.75 CHRM1 (0.45) KDM4EALDH1A1MAPTMEN1USP2
SCHEMBL16018360 0.73 THRB (0.37) KDM4EALDH1A1MAPTMEN1USP2
SCHEMBL23507215 0.72 MAPK1 (0.58) KDM4EMAPK1ATMALDH1A1MAPT
SCHEMBL11506155 0.71 PRMT5 (0.54) KDM4EALDH1A1MAPTMEN1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7179581-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-20 US disclosed
US-7179581-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-20 US disclosed
WO-2005087740-A1 FLUORENONE 1, 4,-DIHYDROPYRIDIN DERIVATIVES BAYER HEALTHCARE AG (DE) 2005-09-22 WO disclosed
WO-2005087740-A1 FLUORENONE 1, 4,-DIHYDROPYRIDIN DERIVATIVES BAYER HEALTHCARE AG (DE) 2005-09-22 WO disclosed