SCHEMBL65284

SCHEMBL65284

CCC(CC)c1ccccn1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.62
KCNA5 P22460 6/20 0.53
KCNH2 Q12809 1/20 0.53
KCNE1 P15382 2/20 0.50
CYP2D6 P10635 1/20 0.50
SLC6A2 P23975 2/20 0.48
SLC6A4 P31645 2/20 0.48
SLC6A3 Q01959 1/20 0.48
CYP1A2 P05177 2/20 0.47
ALDH1A1 P00352 1/20 0.47
CHRM2 P08172 1/20 0.44
SCN1A P35498 1/20 0.44
SCN2A Q99250 1/20 0.44
SCN3A Q9NY46 1/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
GAA P10253 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
NPSR1 Q6W5P4 2/20 0.42
MAPT P10636 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29520435 1.00 TSHR (0.62) TSHRKCNA5KCNH2KCNE1CYP2D6
2-Aminopyridine SCHEMBL6249297 0.89 NOS3 (0.57) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL19090261 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL19090262 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL177780 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL24126990 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL826567 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL20214862 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL19090263 0.88 TSHR (0.55) TSHRKCNA5KCNH2KCNE1CYP2D6
SCHEMBL16124411 0.86 TSHR (0.53) TSHRKCNA5KCNH2KCNE1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1439 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
WO-2024085293-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT 영창케미칼 주식회사 2024-04-25 WO claimed
EP-3564227-B1 METHOD FOR PRODUCING GLYCERIC ACID ESTER DERIVATIVES KAO CORP (JP) 2022-02-23 EP claimed
CN-107407878-B Photosensitive resin composition 东丽株式会社 2020-11-17 CN claimed
US-9796800-B2 Process for producing polydienes BRIDGESTONE CORPORATION (JP) 2017-10-24 US claimed
US-20160108153-A1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORPORATION (JP) 2016-04-21 US claimed
CN-103154044-B Process for producing polydienes BRIDGESTONE CO.,LTD. (JP) 2016-02-17 CN claimed
US-9249244-B2 Process for producing polydienes BRIDGESTONE CORPORATION (JP) 2016-02-02 US claimed
EP-2619233-A1 PROCESS FOR PRODUCING POLYDIENES Bridgestone Corporation (JP) 2013-07-31 EP claimed
WO-2012040026-A1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORPORATION (JP) 2012-03-29 WO claimed
EP-1172878-B1 Non-aqueous electrolytic solution and secondary battery containing same MITSUBISHI CHEM CORP (JP) 2011-06-22 EP claimed
US-6767671-B2 STABILITY; HEAT RESISTANCE MITSUBISHI CHEMICAL CORPORATION (JP) 2004-07-27 US claimed
US-20020025477-A1 Non-aqueous electrolytic solution and secondary battery containing same MITSUBISHI CHEMICAL CORPORATION (JP) 2002-02-28 US claimed
EP-1172878-A2 Non-aqueous electrolytic solution and secondary battery containing same MITSUBISHI CHEMICAL CORPORATION (JP) 2002-01-16 EP claimed
US-5731125-A FOR FORMING RESIST FILM JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-03-24 US claimed
EP-0558280-A1 Chemically amplified resist JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-09-01 EP claimed
EP-0523957-A1 Radiation-sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-01-20 EP claimed
EP-0098684-A2 Modified chichibabin reaction, and novel pyridine derivatives REILLY INDUSTRIES, INC. (US) 1984-01-18 EP claimed
US-4177349-A BY-PRODUCT INHIBITION REILLY TAR & CHEMICAL CORPORATION (US) 1979-12-04 US claimed