SCHEMBL65357

SCHEMBL65357

C=COCC(C)(C)COC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2354810 0.86
SCHEMBL12370544 0.84
SCHEMBL12395557 0.84
SCHEMBL1303234 0.84
SCHEMBL4903431 0.84
SCHEMBL3243481 0.82
SCHEMBL271099 0.81
SCHEMBL274229 0.81
SCHEMBL825416 0.80
SCHEMBL15494303 0.78 ALDH1A1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1770 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024191208-A1 COMPOSITION FOR ENCAPSULATING ORGANIC LIGHT-EMITTING DIODES AND ORGANIC LIGHT-EMITTING DIODES DISPLAY COMPRISING ORGANIC LAYER PREPARED USING SAME 삼성에스디아이주식회사 2024-09-19 WO claimed
EP-2371782-B1 Cartridge or foil pouch containing a chemical two-component mortar composition with improved adhesion to the surface of semi-purified and/or wet bore holes in mineral base and use of same HILTI AG (LI) 2021-06-23 EP claimed
CN-107710077-B Recording material and image forming method 佳能株式会社 2021-03-30 CN claimed
EP-3098664-B1 IMAGE FORMING METHOD CANON KK (JP) 2021-02-17 EP claimed
EP-3306401-B1 RECORDED MATTER AND IMAGE FORMING METHOD CANON KK (JP) 2020-11-11 EP claimed
CN-108271380-B Antifouling composition 佐敦公司 2020-10-23 CN claimed
CN-106200328-B Image forming method 佳能株式会社 2019-11-22 CN claimed
US-10372053-B2 Recorded material and image forming method CANON KABUSHIKI KAISHA (JP) 2019-08-06 US claimed
CN-110016103-A A kind of modified hydroxymethyl starch polymer and its preparation method and application 福建清源科技有限公司 2019-07-16 CN claimed
CN-108271380-A Antifouling composition 佐敦公司 2018-07-10 CN claimed
US-20050019691-A1 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2005-01-27 US claimed
CN-1570765-A Positive photoresist composition and method for forming photoresist pattern IND TECH RES INST (CN) 2005-01-26 CN claimed
US-6706779-B2 Radiation curable compositions containing alkenyl ether functional polyisobutylenes DOW CORNING CORPORATION 2004-03-16 US claimed
US-6703433-B1 LOW CURE ENERGY, VAPOR BARRIERS, DAMPING, HIGH REFRACTIVE INDEX; CORROSION RESISTANCE, TOUGHNESS, TENSILE STRENGTH DOW CORNING CORPORATION 2004-03-09 US claimed
CN-1427856-A Radiation curable compositions containing alkenyl ether functional polyisobutylenes DOW CORNING (US) 2003-07-02 CN claimed
EP-1297040-A1 RADIATION CURABLE COMPOSITIONS CONTAINING ALKENYL ETHER FUNCTIONAL POLYISOBUTYLENES Dow Corning Corporation (US) 2003-04-02 EP claimed
US-20020028303-A1 Radiation curable compositions containing alkenyl ether functional polyisobutylenes DOW CORNING CORPORATION CO1232 2002-03-07 US claimed
WO-2001088003-A1 RADIATION CURABLE COMPOSITIONS CONTAINING ALKENYL ETHER FUNCTIONAL POLYISOBUTYLENES DOW CORNING CORPORATION (US) 2001-11-22 WO claimed
US-5939235-A PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE FUJI PHOTO FILM CO., LTD. (JP) 1999-08-17 US claimed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US claimed