SCHEMBL271099

SCHEMBL271099

C=COCC(C)(COC=C)COC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8758399 0.84 ALDH1A1 (0.31)
SCHEMBL5052127 0.82
SCHEMBL274229 0.81
SCHEMBL65357 0.81
SCHEMBL18258141 0.77
SCHEMBL95083 0.77
SCHEMBL110522 0.77
SCHEMBL273311 0.77
SCHEMBL18675768 0.75 LMNA (0.33)
SCHEMBL17126852 0.75 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1009 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110515270-B Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device 信越化学工业株式会社 2024-07-12 CN claimed
CN-109950614-B Polymer solid electrolyte preparation method, polymer solid electrolyte secondary lithium battery and preparation method 中南大学 2023-09-29 CN claimed
US-11693317-B2 Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US claimed
CN-116218439-A UV cross-linking quick positioning adhesive with low volume shrinkage rate, and preparation method and application thereof 武汉华工正源光子技术有限公司 2023-06-06 CN claimed
CN-108255018-B Photoresist composition comprising poly (p-hydroxystyrene) epoxy resin as film-forming resin 湖北固润科技股份有限公司 2020-12-11 CN claimed
CN-108271380-B Antifouling composition 佐敦公司 2020-10-23 CN claimed
WO-2017009301-A1 ANTIFOULING COMPOSITION JOTUN A/S (NO) 2017-01-19 WO claimed
EP-0565798-B2 Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith BORDEN CHEM INC (US) 2001-03-07 EP claimed
US-5939235-A PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE FUJI PHOTO FILM CO., LTD. (JP) 1999-08-17 US claimed
EP-0565798-B1 Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith BORDEN INC (US) 1998-01-14 EP claimed
US-5639846-A BASED ON A REACTIVELY TERMINATED URETHANE OLIGOMER AND A HYDROCARBON MONOMER TERMINATED WITH AN END GROUP CAPABLE OF REACTING WITH THE TERMINUS OF THE OLIGOMER BORDEN, INC. (US) 1997-06-17 US claimed
US-5536529-A Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith BORDEN, INC. (US) 1996-07-16 US claimed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US claimed
US-5352712-A Modified polyurethane BORDEN, INC. (US) 1994-10-04 US claimed
EP-0565798-A1 Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith BORDEN, INC. (US) 1993-10-20 EP claimed
US-20240240040-A1 INK JET RECORDING INK AND INK JET RECORDING METHOD FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
EP-4400552-A1 ACTIVE ENERGY RAY-CURABLE INKJET INK AND IMAGE RECORDING METHOD FUJIFILM Corporation (JP) 2024-07-17 EP disclosed
EP-0565798-A1 Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith BORDEN, INC. (US) 1993-10-20 EP disclosed
EP-0536690-A1 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-04-14 EP disclosed
EP-0509512-A1 Photosensitive composition for volume hologram recording Nippon Paint Co., Ltd. (JP) 1992-10-21 EP disclosed