SCHEMBL6535913

SCHEMBL6535913

NC=CCc1ccc2ccccc2n1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYSLTR1 Q9Y271 2/20 0.46
CYSLTR2 Q9NS75 1/20 0.46
CYP1A2 P05177 3/20 0.44
NCF1 P14598 1/20 0.44
NOS2 P35228 1/20 0.44
BACE1 P56817 1/20 0.44
PDE10A Q9Y233 2/20 0.40
CA12 O43570 1/20 0.39
CA9 Q16790 1/20 0.39
ALDH1A1 P00352 2/20 0.39
MAPT P10636 2/20 0.39
NPC1 O15118 2/20 0.39
CYP3A4 P08684 2/20 0.39
RAB9A P51151 2/20 0.39
MEN1 O00255 1/20 0.39
TP53 P04637 1/20 0.39
MAPK1 P28482 1/20 0.39
KMT2A Q03164 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HIF1A Q16665 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL456812 0.85 CYP1A2 (0.46) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL5093242 0.85 CYP1A2 (0.46) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL8754671 0.81 CYSLTR1 (0.46) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL8754663 0.81 CYSLTR1 (0.46) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL1115865 0.81 CYP1A2 (0.46) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL5510083 0.81 CYSLTR1 (0.46) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL6525088 0.80 CYSLTR1 (0.52) CYSLTR1CYSLTR2CYP1A2NCF1NOS2
SCHEMBL17500352 0.80 CYSLTR1 (0.49) CYSLTR1CYSLTR2CYP1A2PDE10AGPBAR1
SCHEMBL27924057 0.79 CYP1A2 (0.44) CYSLTR1CYSLTR2CYP1A2PDE10AALDH1A1
SCHEMBL28009473 0.79 LMNA (0.54) CYSLTR1CYSLTR2CYP1A2ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110537148-A Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORP 2019-12-03 CN disclosed
CN-104067174-B Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, electronic device, and method for producing same 富士胶片株式会社 2017-10-24 CN disclosed
CN-103718109-B Photosensitive polymer combination and film, pattern forming material, polyimide film, relief pattern and preparation method and semiconductor device 富士胶片株式会社 2017-06-23 CN disclosed
CN-106796401-A Pattern forming method, composition for forming upper layer film, resist pattern, and method for manufacturing electronic device 富士胶片株式会社 2017-05-31 CN disclosed
CN-106716257-A Pattern forming method, resist pattern, and electronic device manufacturing method 富士胶片株式会社 2017-05-24 CN disclosed
CN-106605174-A Pattern forming method, composition for forming protective film, method for manufacturing electronic component, and electronic component 富士胶片株式会社 2017-04-26 CN disclosed
US-20040068068-A1 Optically active polymer with epoxide functions, method for preparing same, and use thereof UNIVERSITY CLAUDE BERNARD LYON 1 (FR) 2004-04-08 US disclosed
US-4138292-A ENZYMES OR MICROORGANISMS IN A SULFATED POLYSACCHARIDE GEL TANABE SEIYAKU CO., LTD. (JP) 1979-02-06 US disclosed