SCHEMBL6536291

SCHEMBL6536291

C=COCCOC(=O)c1ccco1

nearest known ligand 0.51

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.51
LMNA P02545 2/20 0.51
KMT2A Q03164 5/20 0.50
MAPT P10636 2/20 0.48
TSHR P16473 2/20 0.47
HTT P42858 1/20 0.47
MEN1 O00255 1/20 0.47
HSD17B10 Q99714 1/20 0.47
NPC1 O15118 1/20 0.45
MAPK1 P28482 1/20 0.44
KDM4E B2RXH2 1/20 0.44
HPGD P15428 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
GLA P06280 1/20 0.43
CES2 O00748 1/20 0.43
CES1 P23141 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11039202 0.87 ALDH1A1 (0.62) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL434646 0.84 ALDH1A1 (0.51) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL28689326 0.83 ALDH1A1 (0.52) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL20740992 0.82 ALDH1A1 (0.58) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL3146763 0.82 ALDH1A1 (0.57) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL31337846 0.80 ALDH1A1 (0.59) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL15256939 0.80 ALDH1A1 (0.59) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL17959698 0.79 ALDH1A1 (0.51) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL11332447 0.79 ALDH1A1 (0.49) ALDH1A1LMNAKMT2AMAPTTSHR
SCHEMBL28283977 0.79 ALDH1A1 (0.49) ALDH1A1LMNAKMT2AMAPTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6727033-B2 A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed