Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.37 |
| ▸ | MYC | P01106 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 5/20 | 0.33 |
| ▸ | CA1 | P00915 | 4/20 | 0.33 |
| ▸ | MMP1 | P03956 | 3/20 | 0.32 |
| ▸ | MMP2 | P08253 | 3/20 | 0.32 |
| ▸ | MMP9 | P14780 | 3/20 | 0.32 |
| ▸ | MMP13 | P45452 | 3/20 | 0.32 |
| ▸ | MMP8 | P22894 | 2/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | MMP3 | P08254 | 1/20 | 0.31 |
| ▸ | MMP12 | P39900 | 1/20 | 0.31 |
| ▸ | MMP14 | P50281 | 1/20 | 0.31 |
| ▸ | TTR | P02766 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL776735 | 0.83 | MYC (0.39) | HSD11B1MYCMMP1MMP2MMP9 | |
| SCHEMBL8905178 | 0.82 | MYC (0.38) | HSD11B1MYCMMP1MMP2MMP9 | |
| SCHEMBL4202392 | 0.77 | MYC (0.47) | MYCCA2CA1MMP1MMP2 | |
| SCHEMBL30446463 | 0.77 | MYC (0.47) | MYCCA2CA1MMP1MMP2 | |
| SCHEMBL779322 | 0.77 | HSD11B1 (0.40) | HSD11B1MYCCA2CA1MMP1 | |
| SCHEMBL777342 | 0.74 | MYC (0.42) | HSD11B1MYCMMP1MMP2MMP9 | |
| SCHEMBL778277 | 0.73 | MYC (0.41) | HSD11B1MYCCA2MMP1MMP2 | |
| SCHEMBL11341783 | 0.72 | MGLL (0.47) | MYCTTR | |
| SCHEMBL1807545 | 0.72 | MYC (0.43) | MYCCA2CA1MMP1MMP2 | |
| SCHEMBL1807544 | 0.72 | MYC (0.43) | MYCCA2CA1MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6756179-B2 | A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |