SCHEMBL6536540

SCHEMBL6536540

C=COCCOC(=O)Cc1cccs1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 6/20 0.49
▸ POLB P06746 4/20 0.49
▸ ALDH1A1 P00352 3/20 0.49
▸ MAPT P10636 1/20 0.49
▸ TDP1 Q9NUW8 1/20 0.49
▸ SMN1; SMN2 Q16637 4/20 0.47
▸ TSHR P16473 1/20 0.47
▸ NPC1 O15118 4/20 0.46
▸ MEN1 O00255 2/20 0.44
▸ KMT2A Q03164 2/20 0.44
▸ PKM P14618 1/20 0.43
▸ HPGD P15428 1/20 0.42
▸ CYP2C19 P33261 2/20 0.41
▸ RAB9A P51151 2/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ CASP3 P42574 1/20 0.40
▸ SENP8 Q96LD8 1/20 0.40
▸ SENP7 Q9BQF6 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6241173 0.80 L3MBTL1 (0.52) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL5794329 0.80 NPC1 (0.49) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL11254794 0.79 L3MBTL1 (0.49) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL9495408 0.78 NPC1 (0.58) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL11249841 0.78 L3MBTL1 (0.50) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL11258911 0.78 L3MBTL1 (0.50) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL6536772 0.77 TAAR1 (0.48) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL9498848 0.76 ALDH1A1 (0.59) L3MBTL1POLBALDH1A1MAPTTDP1
SCHEMBL6536489 0.76 ALDH1A1 (0.56) L3MBTL1POLBALDH1A1MAPTSMN1; SMN2
SCHEMBL9495815 0.75 ALDH1A1 (0.54) L3MBTL1POLBALDH1A1MAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6727033-B2 A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 — — US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 — — US disclosed
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