SCHEMBL6536656

SCHEMBL6536656

Cc1cc(C)c(O)c(C(C)C(c2cc(C)cc(C)c2O)c2cc(C)cc(C)c2O)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.43
LMNA P02545 3/20 0.43
KDM4E B2RXH2 2/20 0.43
GAA P10253 2/20 0.43
MAPT P10636 2/20 0.43
CA2 P00918 3/20 0.36
CA1 P00915 2/20 0.36
SELL P14151 1/20 0.36
SELP P16109 1/20 0.36
SELE P16581 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.34
TRPA1 O75762 1/20 0.32
CHRM1 P11229 1/20 0.32
SLC6A2 P23975 1/20 0.32
ADRA1A P35348 1/20 0.32
HTR2B P41595 1/20 0.32
TP53 P04637 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
POLB P06746 1/20 0.31
TYR P14679 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29720404 0.89 ALDH1A1 (0.48) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL223172 0.85 ALDH1A1 (0.45) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL29350282 0.85 ALDH1A1 (0.45) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL4402447 0.80 CA1 (0.52) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL5612512 0.80 ALDH1A1 (0.48) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL29612051 0.80 ALDH1A1 (0.48) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL14606485 0.79 ALDH1A1 (0.39) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL13447396 0.79 ALDH1A1 (0.39) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL12620465 0.79 ALDH1A1 (0.39) ALDH1A1LMNAKDM4EGAAMAPT
SCHEMBL8571460 0.78 ALDH1A1 (0.46) ALDH1A1LMNAKDM4EGAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6727036-B2 COMPRISING A RESIN HAVING AN ACID-DECOMPOSING GROUP WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE ALKALI SOLUBILITY, COMPOUNDS GENERATE ACID BY IRRIADIATION OF ACTIVE LIGHT (ONE CONTRIBUTES DECOMPOSITION OTHER DOES NOT), SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20010033993-A1 Positive-working radiation-sensitive composition FUJIFILM CORPORATION (JP) 2001-10-25 US disclosed