⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL45499 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL20969334 | 0.94 | — | — | |
| SCHEMBL12236882 | 0.85 | FDPS (0.30) | — | |
| Sulfuric Acid SCHEMBL5488887 | 0.84 | CES1 (0.34) | — | |
| Sulfuric Acid SCHEMBL5490610 | 0.82 | CES1 (0.33) | — | |
| SCHEMBL1221382 | 0.80 | TSHR (0.35) | — | |
| SCHEMBL6681360 | 0.80 | — | — | |
| SCHEMBL1768648 | 0.80 | — | — | |
| SCHEMBL17136266 | 0.80 | TSHR (0.35) | — | |
| SCHEMBL30814731 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109153653-B | Novel compound, photocurable composition, cured product thereof, printing ink, and printed matter using the printing ink | DIC株式会社 | 2022-06-28 | — | — | CN | disclosed |
| US-11079675-B2 | Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink | DIC CORPORATION (JP) | 2021-08-03 | — | — | US | disclosed |
| CN-111954848-A | Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member | DIC株式会社 | 2020-11-17 | — | — | CN | disclosed |
| WO-2019181954-A1 | POLYMERIZABLE COMPOUND, PHOTOCURABLE POLYMER, INSULATING FILM, PROTECTIVE FILM, AND ORGANIC TRANSISTOR DEVICE | 東ソー株式会社 | 2019-09-26 | — | — | WO | disclosed |
| US-20190137872-A1 | NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK | DIC CORPORATION (JP) | 2019-05-09 | — | — | US | disclosed |
| US-9562122-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20160053032-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-6756179-B2 | A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |