SCHEMBL6536815

SCHEMBL6536815

C=C(CC=C(C)C(=O)O)C(=O)OC12CC3CC(CC(C3)C1C)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5917735 0.81 EPHX2 (0.32)
SCHEMBL27737108 0.80 EPHX2 (0.33)
SCHEMBL251058 0.79 NAAA (0.32)
SCHEMBL5917734 0.78 EPHX2 (0.32)
SCHEMBL27823807 0.76 NAAA (0.31)
SCHEMBL22832087 0.76 NAAA (0.32)
SCHEMBL14763295 0.74
SCHEMBL5857343 0.73 CD81 (0.32)
SCHEMBL27659428 0.72 NAAA (0.35)
SCHEMBL2812415 0.72 NAAA (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6818377-B2 ACID GENERATOR; RESIN CONTAINING A POLYALICYCLIC GROUP OR A FURANONE, CYCLOPENTANONE, PYRROLIDONE OR TETRAHYDROTHIOPHENONE GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-20040161697-A2 Positive Photosensitive Composition FUJI PHOTO FILM CO., LTD. (JP) 2004-08-19 US disclosed
US-20030044718-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2003-03-06 US disclosed
US-6517991-B1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 US disclosed
US-6291130-B1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2001-09-18 US disclosed