Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | SCN1A | P35498 | 1/20 | 0.32 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.32 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | XBP1 | P17861 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27659428 | 0.85 | NAAA (0.35) | NAAAEPHX2NPSR1EPHX1HSD17B10 | |
| SCHEMBL2184378 | 0.84 | HSD17B10 (0.35) | NAAAEPHX2NPSR1EPHX1HSD17B10 | |
| SCHEMBL251058 | 0.83 | NAAA (0.32) | NAAAEPHX2NPSR1ALDH1A1 | |
| SCHEMBL5917758 | 0.82 | THRB (0.37) | NAAANPSR1HSD17B10GLASCN1A | |
| SCHEMBL7749055 | 0.82 | SCN1A (0.46) | NPSR1GLASCN1ASCN2ASCN3A | |
| SCHEMBL5359724 | 0.81 | NAAA (0.33) | NAAANPSR1HSD17B10GLA | |
| SCHEMBL27673001 | 0.81 | OPRM1 (0.36) | NAAAEPHX2HSD17B10ALDH1A1CNR2 | |
| SCHEMBL27823807 | 0.80 | NAAA (0.31) | NAAASCN1ASCN2ASCN3A | |
| SCHEMBL8765832 | 0.80 | EPHX1 (0.35) | EPHX2EPHX1GLASCN1ASCN2A | |
| SCHEMBL22832087 | 0.80 | NAAA (0.32) | NAAAEPHX2NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100248144-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-30 | — | — | US | disclosed |