SCHEMBL6537458

SCHEMBL6537458

[Li]c1c(C(F)(F)F)cc(C(F)(F)F)cc1C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.40
CACNA1H O95180 6/20 0.35
CACNA1C Q13936 2/20 0.35
CACNA1B Q00975 1/20 0.35
PTPN5 P54829 2/20 0.33
IDO1 P14902 2/20 0.33
CACNA1G O43497 2/20 0.33
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
KIF11 P52732 1/20 0.32
AR P10275 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Boric Acid SCHEMBL27977973 0.91 CES2 (0.39) CES2CACNA1HCACNA1CCACNA1BCACNA1G
SCHEMBL11603910 0.77 CES2 (0.43) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL6756054 0.74 CES2 (0.41) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL15933661 0.74 CES2 (0.41) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL23174658 0.72 CES2 (0.40) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL3194447 0.72 CES2 (0.45) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL16554203 0.72 CES2 (0.40) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL3190814 0.72 CES2 (0.40) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL1042998 0.72 CES2 (0.40) CES2CACNA1HCACNA1CCACNA1BIDO1
SCHEMBL23174646 0.72 CES2 (0.40) CES2CACNA1HCACNA1CCACNA1BIDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1148396-C Photoeresist composition comprising polycyclic polymers with acid labile pendant groups ס�ѵ�ľ��ʽ���� 2004-05-05 CN disclosed
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
CN-1269810-A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups GOODRICH CO B F (US) 2000-10-11 CN disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed