SCHEMBL6537566

SCHEMBL6537566

CC[Si](CC)(CC)C1=CC2CCC1C2

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL483868 0.77 CYP19A1 (0.31) CYP19A1
SCHEMBL8852206 0.76 CYP19A1 (0.35) CYP19A1
SCHEMBL7459517 0.76 CYP19A1 (0.33) CYP19A1
SCHEMBL18929693 0.74 CYP19A1 (0.32) CYP19A1
SCHEMBL8851767 0.74 CYP19A1 (0.35) CYP19A1
SCHEMBL6841964 0.73 CYP19A1 (0.33) CYP19A1
SCHEMBL5385537 0.73
SCHEMBL4452321 0.72 CYP19A1 (0.31) CYP19A1
SCHEMBL2122664 0.72 CYP19A1 (0.32) CYP19A1
SCHEMBL8851736 0.72 CYP19A1 (0.35) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
CN-1269810-A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups GOODRICH CO B F (US) 2000-10-11 CN disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed