Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 3/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | CXCR3 | P49682 | 2/20 | 0.36 |
| ▸ | CHRNB2 | P17787 | 4/20 | 0.36 |
| ▸ | CHRNB4 | P30926 | 4/20 | 0.36 |
| ▸ | CHRNA3 | P32297 | 4/20 | 0.36 |
| ▸ | CHRNA7 | P36544 | 4/20 | 0.36 |
| ▸ | CHRNA4 | P43681 | 4/20 | 0.36 |
| ▸ | CHRNA1 | P02708 | 3/20 | 0.36 |
| ▸ | CHRNG | P07510 | 3/20 | 0.36 |
| ▸ | CHRNB1 | P11230 | 3/20 | 0.36 |
| ▸ | CHRND | Q07001 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL10543747 | 0.81 | EPHX2 (0.40) | EPHX2ALDH1A1MAPTMAPK1KMT2A | |
| SCHEMBL4498337 | 0.77 | ALDH1A1 (0.33) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| Dexborneol SCHEMBL5031066 | 0.75 | EPHX2 (0.41) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| Dexborneol SCHEMBL20576252 | 0.75 | EPHX2 (0.41) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| Dexborneol SCHEMBL3507513 | 0.75 | EPHX2 (0.41) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| SCHEMBL24853669 | 0.75 | EPHX2 (0.41) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| Dexborneol SCHEMBL23849409 | 0.75 | EPHX2 (0.41) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| Borneol SCHEMBL20576251 | 0.75 | EPHX2 (0.41) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| SCHEMBL247021 | 0.75 | ALDH1A1 (0.39) | EPHX2GAAALDH1A1MAPTMAPK1 | |
| SCHEMBL542034 | 0.75 | ALDH1A1 (0.39) | EPHX2GAAALDH1A1MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108885396-B | Positive working photosensitive material | 默克专利有限公司 | 2023-03-24 | — | — | CN | claimed |
| US-20220342308-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIALS | MERCK PATENT GMBH (DE) | 2022-10-27 | — | — | US | claimed |
| CN-114651212-A | Positive photosensitive material | 默克专利股份有限公司 | 2022-06-21 | — | — | CN | claimed |
| EP-2862024-B1 | POSITIVE PHOTOSENSITIVE MATERIAL | MERCK PATENT GMBH (DE) | 2021-12-01 | — | — | EP | claimed |
| US-10976662-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2021-04-13 | — | — | US | claimed |
| CN-112654928-A | Positive photosensitive material | 默克专利股份有限公司 | 2021-04-13 | — | — | CN | claimed |
| EP-3446180-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-04-01 | — | — | EP | claimed |
| EP-2929397-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-03-18 | — | — | EP | claimed |
| EP-2861638-B1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2018-11-14 | — | — | EP | claimed |
| US-9012126-B2 | Positive photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-04-21 | — | — | US | claimed |
| US-8906594-B2 | Negative-working thick film photoresist | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-12-09 | — | — | US | claimed |
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | claimed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | claimed |
| US-20130337380-A1 | POSITIVE PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2013-12-19 | — | — | US | claimed |
| US-20130337381-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2013-12-19 | — | — | US | claimed |
| EP-0154339-B1 | OPTICAL FIBER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-06-07 | — | — | EP | claimed |
| WO-2024076047-A1 | COMPOSITION FOR PLANT DISEASE CONTROL COMPRISING CULTURE FLUID OF STREPTOMYCES LYDICUS JCK-6019 STRAIN OR EXTRACT OF CULTURE FLUID OF STRAIN, PREPARATION METHOD THEREFOR, AND PLANT DISEASE CONTROL METHOD | 전남대학교산학협력단 | 2024-04-11 | — | — | WO | disclosed |
| CN-111642129-B | Imide-terminated prepolymer, preparation method thereof, curable resin composition, application thereof and dual-curing method | 浙江迅实科技有限公司 | 2023-06-23 | — | — | CN | disclosed |
| US-20020042018-A1 | Positive chemically amplified resist and method for forming its pattern | NEC CORPORATION | 2002-04-11 | — | — | US | disclosed |
| US-20010026901-A1 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2001-10-04 | — | — | US | disclosed |