SCHEMBL65441

SCHEMBL65441

COC(=O)CN1CCCC1

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.50
TDP1 Q9NUW8 1/20 0.50
GAA P10253 1/20 0.46
CYP2D6 P10635 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
HTT P42858 1/20 0.42
TSHR P16473 1/20 0.42
KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65325 0.98 ALDH1A1 (0.53) ALDH1A1TDP1GAACYP2D6SMN1; SMN2
Hydrochloric Acid SCHEMBL4391137 0.98 ALDH1A1 (0.53) ALDH1A1TDP1GAACYP2D6SMN1; SMN2
Hydrochloric Acid SCHEMBL27501008 0.96 ALDH1A1 (0.56) ALDH1A1TDP1GAACYP2D6SMN1; SMN2
Hydrochloric Acid SCHEMBL28645405 0.96 ALDH1A1 (0.56) ALDH1A1TDP1GAACYP2D6SMN1; SMN2
SCHEMBL28738942 0.95
Hydrochloric Acid SCHEMBL28912856 0.93 ALDH1A1 (0.49) ALDH1A1TDP1GAACYP2D6SMN1; SMN2
SCHEMBL12379861 0.90 TSHR (0.46) ALDH1A1TDP1GAASMN1; SMN2TSHR
SCHEMBL70778 0.90 TSHR (0.46) ALDH1A1TDP1GAASMN1; SMN2TSHR
SCHEMBL1133592 0.90
SCHEMBL19379914 0.83 ALDH1A1 (0.49) ALDH1A1TDP1GAACYP2D6SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 595 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103820416-B High-stereoselectivity esterolytic enzyme, encoding gene and application of encoding gene 浙江工业大学 2017-04-12 CN claimed
US-12032287-B2 Resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-09 US disclosed
CN-114591318-B Pyrazolo heterocyclic compound, preparation method thereof, pharmaceutical composition and application 中国医学科学院药物研究所 2024-06-21 CN disclosed
US-11994798-B2 Resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-28 US disclosed
CN-114507243-B Isothiazolo heterocyclic compounds, preparation method, pharmaceutical composition and application thereof 中国医学科学院药物研究所 2024-05-14 CN disclosed
WO-2023183616-A1 NOVEL IONIZABLE LIPIDS AND LIPID NANOPARTICLES AND METHODS OF USING THE SAME SENDA BIOSCIENCES, INC. (US) 2023-09-28 WO disclosed
WO-2023178538-A1 METHOD FOR PURIFYING LEVETIRACETAM INTERMEDIATE 浙江华海药业股份有限公司 2023-09-28 WO disclosed
CN-112500353-B Levosimendan prodrug compound, preparation method and application thereof 北京晨光同创医药研究院有限公司 2022-11-25 CN disclosed
CN-115093355-A Preparation method of pyrrole ester compound 河南农业大学 2022-09-23 CN disclosed
CN-114591318-A Pyrazolo heterocyclic compound, preparation method thereof, pharmaceutical composition and application 中国医学科学院药物研究所 2022-06-07 CN disclosed
US-20020168581-A1 Silicon-containing polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-11-14 US disclosed
US-20020150835-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-17 US disclosed
US-20020132182-A1 Polymers, resist materials, and pattern formation method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-09-19 US disclosed
EP-1236745-A2 Silicon-containing polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-09-04 EP disclosed
US-20020115807-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed
US-20020115821-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed
US-20020102493-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-01 US disclosed
US-20020098443-A1 Amine compounds, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-07-25 US disclosed
US-20020061463-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-23 US disclosed
EP-1195390-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020098443-A1 Amine compounds, resist compositions and patterning process PARG, EHMT1, EHMT2 ALDH1A1 4186/4885TDP1 3409/4885GAA 4597/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.