SCHEMBL6544566

SCHEMBL6544566

NCCCC[SiH](O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4514732 0.97 DNM1 (0.50)
SCHEMBL4525756 0.97 DNM1 (0.50)
SCHEMBL4530381 0.97 DNM1 (0.50)
SCHEMBL4512129 0.97 DNM1 (0.50)
SCHEMBL6544660 0.90
SCHEMBL25351660 0.75
SCHEMBL10977397 0.75
SCHEMBL9871531 0.75 CA12 (0.52)
SCHEMBL14979287 0.74
Putrescine SCHEMBL21642 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114551804-A Composition for forming positive pole piece film, positive pole piece and preparation method thereof, and secondary battery 深圳市研一新材料有限责任公司 2022-05-27 CN claimed
US-12545691-B2 Tertiary hydroxyl functional alkoxysilanes and methods for preparing thereof HENKEL AG & CO. KGAA (DE) 2026-02-10 US disclosed
US-11560445-B2 Silylated polyurethanes and methods for preparing thereof HENKEL AG & CO. KGAA (DE) 2023-01-24 US disclosed
US-20220363699-A1 Tertiary Hydroxyl Functional Alkoxysilanes and Methods for Preparing Thereof HENKEL AG & CO. KGAA (DE) 2022-11-17 US disclosed
EP-3498748-B1 SILYLATED POLYURETHANES AND METHODS FOR PREPARING THEREOF HENKEL AG & CO KGAA (DE) 2022-02-02 EP disclosed
US-11078323-B2 Silane coupling agents HENKEL AG & CO. KGAA (DE) 2021-08-03 US disclosed
EP-3655452-B1 SILYLATED POLYURETHANES AND METHODS FOR PREPARING THEREOF HENKEL AG & CO KGAA (DE) 2021-07-07 EP disclosed
EP-3498719-B1 TERTIARY HYDROXYL FUNCTIONAL ALKOXYSILANES AND METHODS FOR PREPARING THEREOF HENKEL AG & CO KGAA (DE) 2021-03-03 EP disclosed
US-10889682-B2 Silylated polyurethanes and methods for preparing thereof HENKEL AG & CO. KGAA (DE) 2021-01-12 US disclosed
US-20200299314-A1 Tertiary Hydroxyl Functional Alkoxysilanes and Methods for Preparing Thereof HENKEL AG & CO KGAA (DE) 2020-09-24 US disclosed
WO-2000046035-A9 PRINTABLE MEDIA AND METHOD FOR ITS PREPARATION BY INK-JET PRINTING SUN CHEMICAL CORP (US) 2001-09-20 WO disclosed
US-6261740-B1 Processless, laser imageable lithographic printing plate KODAK POLYCHROME GRAPHICS, LLC 2001-07-17 US disclosed
US-6245421-B1 THERMOPLASTIC INK RECEIVERS KODAK POLYCHROME GRAPHICS LLC 2001-06-12 US disclosed
EP-1082223-A1 IMAGING AND PRINTING METHODS USING CLAY-CONTAINING FLUID RECEIVING ELEMENT Kodak Polychrome Graphics Company Ltd. (US) 2001-03-14 EP disclosed
EP-1082227-A1 HYDROPHILIZED POROUS SUBSTRATE FOR USE IN LITHOGRAPHIC PRINTING PLATES Kodak Polychrome Graphics (US) 2001-03-14 EP disclosed
EP-1029668-A2 Processless, laser imageable lithographic printing plate Kodak Polychrome Graphics Company Ltd. (US) 2000-08-23 EP disclosed
WO-2000046034-A1 PRINTABLE MEDIA AND METHOD FOR ITS PREPARATION BY INK-JET PRINTING KODAK POLYCHROME GRAPHICS LLC (US) 2000-08-10 WO disclosed
WO-2000046029-A1 IMAGING AND PRINTING METHODS USING CLAY-CONTAINING FLUID RECEIVING ELEMENT KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) 2000-08-10 WO disclosed
WO-2000046039-A1 HYDROPHILIZED POROUS SUBSTRATE FOR USE IN LITHOGRAPHIC PRINTING PLATES KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) 2000-08-10 WO disclosed
WO-2000046035-A1 PRINTABLE MEDIA AND METHOD FOR ITS PREPARATION BY INK-JET PRINTING SUN CHEMICAL CORPORATION (US) 2000-08-10 WO disclosed