Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 5/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA3 | P07451 | 1/20 | 0.46 |
| ▸ | CA4 | P22748 | 1/20 | 0.46 |
| ▸ | CA6 | P23280 | 1/20 | 0.46 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
| ▸ | CA7 | P43166 | 1/20 | 0.46 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.46 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL780280 | 0.84 | ALDH1A1 (0.60) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL384939 | 0.84 | HTR6 (0.50) | HTR6ALDH1A1PSIP1CA1CA2 | |
| Fluoride SCHEMBL775526 | 0.82 | ALDH1A1 (0.58) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL19033894 | 0.82 | HTR6 (0.48) | HTR6ALDH1A1PSIP1CA1CA2 | |
| Benzene SCHEMBL8203386 | 0.81 | HTR6 (0.52) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL152444 | 0.81 | HTR6 (0.52) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL4640457 | 0.81 | HTR6 (0.52) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL7321456 | 0.80 | HTR6 (0.46) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL5961978 | 0.80 | HTR6 (0.46) | HTR6ALDH1A1PSIP1CA1CA2 | |
| SCHEMBL16469554 | 0.80 | HTR6 (0.46) | HTR6ALDH1A1PSIP1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040248042-A1 | using material having both of dry etching resistance and high transparency in exposure light having a short wavelength such as F2 laser beam | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040234899-A1 | Method of forming fine pattern | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-11-25 | — | — | US | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| US-20040101787-A1 | Fine pattern forming method | DAIKIN INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1413927-A1 | METHOD FOR FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-1376230-A1 | FINE PATTERN FORMING METHOD | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6054254-A | COATING WITH PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-25 | — | — | US | disclosed |
| EP-0654149-B1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AG (DE) | 1997-02-05 | — | — | EP | disclosed |
| EP-0654149-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH. | HOECHST AG (DE) | 1995-05-24 | — | — | EP | disclosed |
| US-5372914-A | Pattern forming method | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-12-13 | — | — | US | disclosed |
| US-5348838-A | Photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |
| WO-1994003837-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-17 | — | — | WO | disclosed |