Acrylic Acid

Acrylic Acid

SCHEMBL6547641

C=C(COCCCC)C(N)=O.C=CC(=O)O

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.43
HPGD P15428 1/20 0.43
CES2 O00748 2/20 0.40
HCAR2 Q8TDS4 3/20 0.38
EPHX2 P34913 1/20 0.35
ALOX15 P16050 1/20 0.34
HSD17B10 Q99714 1/20 0.34
ATM Q13315 1/20 0.34
PLA2G4B P0C869 3/20 0.33
MAPT P10636 1/20 0.33
RAB9A P51151 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
ZDHHC20 Q5W0Z9 1/20 0.33
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.32
RECQL P46063 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL295594 0.90 CES2 (0.47) TSHRHPGDCES2EPHX2ATM
SCHEMBL21618437 0.84 CES2 (0.55) TSHRCES2EPHX2PLA2G4BMAPT
SCHEMBL6882009 0.83 CES2 (0.58) TSHRCES2EPHX2PLA2G4BMAPT
Acrylic Acid SCHEMBL3649132 0.80 TSHR (0.57) TSHRHPGDCES2HCAR2HSD17B10
SCHEMBL5068236 0.79 CES2 (0.36) TSHRCES2ALOX15HSD17B10THRB
Acrylic Acid SCHEMBL11428584 0.78 ALOX15 (0.39) TSHRHPGDCES2ALOX15HSD17B10
Acrylic Acid SCHEMBL31211739 0.77 TSHR (0.53) TSHRHPGDCES2HCAR2ATM
SCHEMBL2786442 0.77 CES2 (0.48) TSHRHPGDCES2HCAR2EPHX2
Acrylic Acid SCHEMBL8463934 0.75 TSHR (0.56) TSHRHPGDCES2HCAR2HSD17B10
Acrylamide SCHEMBL5798455 0.75 TSHR (0.55) TSHRHPGDCES2HCAR2HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0545645-B1 Solid processing chemicals for light-sensitive halide photographic material KONISHIROKU PHOTO IND (JP) 2004-01-28 EP disclosed
US-5376509-A Comprising cyclodextrin compounds and devloper; storage stable KONICA CORPORATION (JP) 1994-12-27 US disclosed
EP-0545645-A1 Solid processing chemicals for light-sensitive halide photographic material KONICA CORPORATION (JP) 1993-06-09 EP disclosed
US-H1063-H Containing hydrazine compound for high contrast image by fast processing KONICA CORPORATION, A CORP. OF JAPAN (JP) 1992-06-02 US disclosed
EP-0368229-A2 Negative type light-sensitive halide photographic material KONICA CORPORATION (JP) 1990-05-16 EP disclosed