SCHEMBL6548846

SCHEMBL6548846

CCCCS(CCCC)(CC(=O)CCC)OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FAAH O00519 3/20 0.32
CES2 O00748 2/20 0.32
CES1 P23141 1/20 0.32
F2 P00734 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
MMP1 P03956 1/20 0.30
MMP2 P08253 1/20 0.30
MMP9 P14780 1/20 0.30
MMP8 P22894 1/20 0.30
MMP13 P45452 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6548949 0.99 CES1 (0.33) FAAHCES2CES1
SCHEMBL6549731 0.95 FAAH (0.32) FAAHCES2CES1F2PRSS1
SCHEMBL6551072 0.94 FAAH (0.34) FAAHCES2CES1F2PRSS1
SCHEMBL6549545 0.94 CES1 (0.33) FAAHCES2CES1
SCHEMBL6548908 0.93 FAAH (0.36) FAAHCES2CES1
SCHEMBL6550394 0.92 FAAH (0.35) FAAHCES2CES1
SCHEMBL6550560 0.91 FAAH (0.37) FAAHCES2CES1
SCHEMBL6549662 0.91 CES1 (0.33) FAAHCES2CES1F2PRSS1
SCHEMBL6549542 0.90 CES1 (0.33) FAAHCES2CES1F2PRSS1
SCHEMBL6549968 0.89 CA2 (0.33) F2PRSS1PRSS2PRSS3CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed