SCHEMBL6549192

SCHEMBL6549192

CCCCCC(=O)CS(CC)(CC)OS(=O)(=O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 11/20 0.41
KMT2A Q03164 2/20 0.41
MAPT P10636 1/20 0.41
CES1 P23141 6/20 0.40
CES2 O00748 4/20 0.40
MEN1 O00255 1/20 0.40
CYP1A2 P05177 1/20 0.40
HSD17B10 Q99714 1/20 0.40
HAO1 Q9UJM8 1/20 0.38
AKR1B1 P15121 1/20 0.37
GPR84 Q9NQS5 2/20 0.36
PPARG P37231 2/20 0.36
PPARD Q03181 2/20 0.36
PPARA Q07869 2/20 0.36
ALDH1A1 P00352 1/20 0.36
TSHR P16473 1/20 0.36
SLC22A6 Q4U2R8 1/20 0.36
SLC22A8 Q8TCC7 1/20 0.36
TLR2 O60603 1/20 0.36
HDAC11 Q96DB2 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550531 0.98 KMT2A (0.43) FAAHKMT2AMAPTCES1CES2
SCHEMBL6548890 0.95 FAAH (0.35) FAAHKMT2AMAPTCES1CES2
SCHEMBL6549520 0.91 FAAH (0.39) FAAHKMT2AMAPTCES1CES2
SCHEMBL6551140 0.90 KMT2A (0.41) FAAHKMT2AMAPTCES1CES2
SCHEMBL6549785 0.89 FFAR3 (0.31) FAAHCES1CES2
SCHEMBL6550759 0.86 FAAH (0.36) FAAHKMT2AMAPTCES1CES2
SCHEMBL6551198 0.84 FAAH (0.41) FAAHKMT2AMAPTCES1CES2
SCHEMBL6550702 0.84 FAAH (0.36) FAAHKMT2AMAPTCES1CES2
SCHEMBL6550880 0.83 FAAH (0.37) FAAHKMT2AMAPTCES1CES2
SCHEMBL6549410 0.83 FAAH (0.35) FAAHKMT2AMAPTCES1CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed