SCHEMBL6548890

SCHEMBL6548890

CCCCC(=O)CS(CC)(CC)OS(=O)(=O)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
FAAH O00519 11/20 0.35
CES1 P23141 7/20 0.35
CES2 O00748 5/20 0.35
KMT2A Q03164 2/20 0.34
MAPT P10636 1/20 0.34
MEN1 O00255 1/20 0.33
CYP1A2 P05177 1/20 0.33
HSD17B10 Q99714 1/20 0.33
PLA2G4A P47712 1/20 0.32
HAO1 Q9UJM8 1/20 0.32
EPHX1 P07099 1/20 0.31
AKR1B1 P15121 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549192 0.95 FAAH (0.41) FAAHCES1CES2KMT2AMAPT
SCHEMBL6550531 0.94 KMT2A (0.43) FAAHCES1CES2KMT2AMAPT
SCHEMBL6550759 0.91 FAAH (0.36) FAAHCES1CES2KMT2AMAPT
SCHEMBL6549785 0.90 FFAR3 (0.31) FAAHCES1CES2
SCHEMBL6549520 0.86 FAAH (0.39) FAAHCES1CES2KMT2AMAPT
SCHEMBL6551140 0.85 KMT2A (0.41) FAAHCES1CES2KMT2AMAPT
SCHEMBL6551263 0.84 FAAH (0.36) FAAHCES1CES2KMT2AMEN1
SCHEMBL6550735 0.84 FAAH (0.35) FAAHCES1CES2KMT2AMAPT
SCHEMBL6549668 0.84 FAAH (0.31) FAAHCES1CES2
SCHEMBL6550659 0.83 HSD11B1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed